Challenges in scaling of IPVD deposited Ta barriers on OSG low‐k films: Carbonization of Ta by CHx radicals generated through VUV‐induced decomposition of carbon‐containing groups... von Ryabinkin, Alexey N., Vishnevskiy, Alexey S., Naumov, Sergej, Serov, Alexander O., Maslakov, Konstantin I., Seregin, Dmitry S., Vorotyntsev, Dmitry A., Pal, Alexander F., Rakhimova, Tatyana V., Vorotilov, Konstantin A., Baklanov, Mikhail R.

Volltext

Damage to OSG low‐k films during IPVD deposition of the Ta barrier layer von Serov, Alexander O., Ryabinkin, Alexey N., Vishnevskiy, Alexey S., Naumov, Sergej, Pal, Alexander F., Rakhimova, Tatyana V., Seregin, Dmitry S., Vorotilov, Konstantin A., Baklanov, Mikhail R.

Volltext

Thin Metal Film Deposition on Microparticles Trapped in RF Magnetron Discharge Plasma von RUDAVETS, Alexander G, RYABINKIN, Alexey N, SEROV, Alexander O

Volltext