Etch modeling for model-based optical proximity correction for 65nm node von Gardin, Christian, Belledent, Jérôme, Trouiller, Yorick, Borjon, Amandine, Couderc, Christophe, Foussadier, Franck, Yesilada, Emek, Urbani, Jean-Christophe, Sundermann, Frank, Rody, Yves, Saied, Mazen, Planchot, Jonathan, Robert, Frederic

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Etch modeling for model-based optical proximity correction for 65 nm node von Gardin, Christian, Belledent, Jérôme, Trouiller, Yorick, Borjon, Amandine, Couderc, Christophe, Foussadier, Franck, Yesilada, Emek, Urbani, Jean-Christophe, Sundermann, Frank, Rody, Yves, Saied, Mazen, Planchot, Jonathan, Robert, Frederic

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Optimization of the depth of focus based on the analysis of the diffraction orders in the pupil plane von Manakli, S., Trouiller, Y., Schiavone, P., Rody, Y., Goirand, P.-J.

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Critical failure ORC: Improving model accuracy through enhanced model generation von Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Patterson, Kyle, Lucas, Kevin, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Baron, Stanislas, Foussadier, Frank, Schiavone, Patrick

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Analysis of the diffraction pattern for optimal assist feature placement von Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Foussadier, Franck, Planchot, Jonathan, Yesilada, Emek, Montgomery, Patrick, Willkinson, Bill, Saied, Mazen, Martinelli, Catherine, Kerrien, Gurwan, Cam, Laurent Le, Vautrin, Florent, Robert, Frédéric, Schiavone, Patrick

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Method for Exposing an Area on a Substrate to a Beam and Photolithographic System von SCHNEIDER JENS, TEMCHENKO VLAD, RODY YVES FABIEN, LIM CHINTEONG

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Method for exposing an area on a substrate to a beam and photolithographic system von SCHNEIDER JENS, TEMCHENKO VLAD, RODY YVES FABIEN, LIM CHINTEONG

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Method and apparatus for designing an integrated circuit using inverse lithography technology von LUCAS KEVIN DEAN, RODY YVES, BOONE ROBERT ELLIOTT

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METHOD AND APPARATUS FOR DESIGNING AN INTEGRATED CIRCUIT von LUCAS KEVIN DEAN, RODY YVES, BOONE ROBERT ELLIOTT

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Printing of design features using alternating PSM technology with double mask exposure strategy von RODY YVES, COUDERC CHRISTOPHE, PATTERSON KYLE, MIRAMOND-COLLET CORINNE

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Printing of design features using alternating PSM technology with double mask exposure strategy von Patterson, Kyle, Rody, Yves, Couderc, Christophe, Miramond-Collet, Corinne

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Method of Forming a Semiconductor Device Having a Dummy Feature von BOONE ROBERT, RODY YVES, LUCAS KEVIN, MUELLER JUDITH, THOMA RAINER

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METHOD AND APPARATUS FOR DESIGNING AN INTEGRATED CIRCUIT von BOONE, ROBERT, ELLIOTT, LUCAS, KEVIN, DEAN, RODY, YVES

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METHOD OF DETECTING DEFECTS IN AN INTEGRATED CIRCUIT von BORDENAVE, THOMAS, DURPES, ISABELLE, LUCAS, KEVIN, RODY, YVES

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METHOD OF FORMING A SEMICONDUCTOR DEVICE HAVING A DUMMY FEATURE von MUELLER, JUDITH, RAINER, THOMA, LUCAS, KEVIN, BOONE, ROBERT, RODY, YVES

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Printing of design features using alternating PSM technology with double mask exposure strategy von RODY YVES, COUDERC CHRISTOPHE, PATTERSON KYLE, MIRAMOND-COLLET CORINNE

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Verfahren zum Belichten eines Bereichs auf einem Substrat mit einem Strahl und Photolithographisches System von LIM, CHINTEONG, SCHNEIDER, JENS, TEMCHENKO, VLAD, RODY, YVES FABIEN

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Method for forming semiconductor device having pseudo-characteristic von YVES RODY, KEVIN LUCAS, JUDITH MUELLER, ROBERT BOONE, THOMA RAINER

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Method and apparatus for designing an integrated circuit von LUCAS, KEVIN DEAN, BOONE, ROBERT ELLIOTT, RODY, YVES

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Trastuzumab Deruxtecan versus Trastuzumab Emtansine for Breast Cancer von Cortés, Javier, Kim, Sung-Bae, Chung, Wei-Pang, Im, Seock-Ah, Park, Yeon Hee, Hegg, Roberto, Kim, Min Hwan, Tseng, Ling-Ming, Petry, Vanessa, Chung, Chi-Feng, Iwata, Hiroji, Hamilton, Erika, Curigliano, Giuseppe, Xu, Binghe, Huang, Chiun-Sheng, Kim, Jee Hyun, Chiu, Joanne W.Y, Pedrini, Jose Luiz, Lee, Caleb, Liu, Yali, Cathcart, Jillian, Bako, Emarjola, Verma, Sunil, Hurvitz, Sara A

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