Accessing Multiple Conical Intersections in the 3s and 3px Photodissociation of the Hydroxymethyl Radical von RODRIGO, Chirantha P, CHUANCHUAN ZHOU, REISLER, Hanna

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Accessing Multiple Conical Intersections in the 3s and 3p x Photodissociation of the Hydroxymethyl Radical von Rodrigo, Chirantha P, Zhou, Chuanchuan, Reisler, Hanna

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Duschinsky mixing between four non-totally symmetric normal coordinates in the S1-S0 vibronic structure of (E)-phenylvinylacetylene: a quantitative analysis von MÜLLER, Christian W, NEWBY, Josh J, LIU, Ching-Ping, RODRIGO, Chirantha P, ZWIER, Timothy S

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Conformer-specific vibronic spectroscopy and vibronic coupling in a flexible bichromophore: Bis-(4-hydroxyphenyl)methane von Rodrigo, Chirantha P., Müller, Christian W., Pillsbury, Nathan R., James, William H., Plusquellic, David F., Zwier, Timothy S.

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Accessing Multiple Conical Intersections in the 3s and 3p sub(x) Photodissociation of the Hydroxymethyl Radical von Rodrigo, Chirantha P, Zhou, Chuanchuan, Reisler, Hanna

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Rotationally Resolved C sub(2) Symmetric Conformers of Bis-(4-hydroxyphenyl)methane: Prototypical Examples of Excitonic Coupling in the S sub(1) and S sub(2) Electronic States von Chou, Shin Grace, Rodrigo, Chirantha P, Mueller, Christian W, Douglass, Kevin O, Zwier, Timothy S, Plusquellic, David F

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MONITORING THICKNESS IN FACE-UP POLISHING von SWEDEK, Boguslaw A, OSTERHELD, Thomas H, BROWN, Brian J, MIKHAYLICHENKO, Ekaterina A, KARUPPIAH, Lakshmanan, RODRIGO, Chirantha, BENVEGNU, Dominic J

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MONITORING THICKNESS IN FACE-UP POLISHING WITH ROLLER von Rodrigo, Chirantha, Brown, Brian J, Osterheld, Thomas H, Benvegnu, Dominic J, Mikhaylichenko, Ekaterina A, Swedek, Boguslaw A, Karuppiah, Lakshmanan

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ROLLER FOR LOCATION-SPECIFIC WAFER POLISHING von GURUSAMY, Jay, BROWN, Brian J, REDEKER, Fred C, MIKHAYLICHENKO, Ekaterina A, RODRIGO, Chirantha, ZUNIGA, Steven M

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ROLLER FOR LOCATION-SPECIFIC WAFER POLISHING von Rodrigo, Chirantha, Brown, Brian J, Gurusamy, Jay, Zuniga, Steven M, Mikhaylichenko, Ekaterina A, Redeker, Fred C

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SYSTEMS AND METHODS FOR IMPROVED PERFORMANCE IN SEMICONDUCTOR PROCESSING von Rodrigo, Chirantha P, Achanta, Satya Gowthami, Singh, Saravjeet, Kim, Tae Won, Cheung, Tsz Keung, Zhang, Jingchun, Parikh, Suketu A

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Hydrogen plasma based cleaning process for etch hardware von Ingle, Nitin K, Wang, Anchuan, Rodrigo, Chirantha, Ji, Lili, Zhang, Jingchun

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HYDROGEN PLASMA BASED CLEANING PROCESS FOR ETCH HARDWARE von INGLE, Nitin K, WANG, Anchuan, RODRIGO, Chirantha, ZHANG, Jingchun, JI, Lili

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HYDROGEN PLASMA BASED CLEANING PROCESS FOR ETCH HARDWARE von WANG Anchuan, INGLE Nitin K, RODRIGO Chirantha, ZHANG Jingchun, JI Lili

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Hydrogen plasma based cleaning process for etch hardware von WANG, ANCHUAN, INGLE, NITIN K, ZHANG, JINGCHUN, JI, LILI, RODRIGO, CHIRANTHA

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Hydrogen plasma based cleaning process for etch hardware von ZHANG, JINGUN, INGLE, NITIN K, WANG, ANUAN, JI, LI-LI, RODRIGO, CHIRANTHA

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