Controlling gold nanoparticle assembly on electron beam-reduced nitrophenyl self-assembled monolayers via electron dose von Leigh, Simon J., Prieto, Jose L., Bowen, James, Lewis, Scott, Robinson, Alex P.G., Iqbal, Parvez, Preece, Jon A.

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Multi Trigger Resist for EUV Lithography von Popescu, Carmen, Vesters, Yannick, McClelland, Alexandra, Simone, Danilo De, Dawson, Guy, Roth, John, Theis, Wolfgang, Vandenberghe, Geert, Robinson, Alex P.G.

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Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments von Yamamoto, Hiroki, Dawson, Guy, Kozawa, Takahiro, Robinson, Alex P. G.

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Helium ion beam lithography on fullerene molecular resists for sub-10nm patterning von Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren M., Robinson, Alex P.G., Boden, Stuart A.

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High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers von Wang, Xiaolong, Kazazis, Dimitrios, Tseng, Li-Ting, Robinson, Alex P G, Ekinci, Yasin

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A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures von Yang, Dongxu, Chen, Xiangyi, He, Dongsheng, Frommhold, Andreas, Shi, Xiaoqing, Boden, Stuart A, Lebedeva, Maria A, Ershova, Olga V, Palmer, Richard E, Li, Ziyou, Shi, Haofei, Gao, Jianzhi, Pan, Minghu, Khlobystov, Andrei N, Chamberlain, Thomas W, Robinson, Alex P. G

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Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks von Tseng, Li-Ting, Kazazis, Dimitrios, Wang, Xiaolong, Popescu, Carmen M., Robinson, Alex P.G., Ekinci, Yasin

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ニトロフェニル自己組織化単分子膜における電子線誘起極性変化によるブロック共重合体のラメラ配向 von 山本, 洋揮, Dawson, Guy, Robinson, Alex P.G., 古澤, 孝弘

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High aspect ratio silicon and polyimide nanopillars by combination of nanosphere lithography and intermediate mask pattern transfer von Frommhold, Andreas, Robinson, Alex P.G., Tarte, Edward

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Cisplatin adducts of DNA as precursors for nanostructured catalyst materials von Englert, Klaudia, Hendi, Ruba, Robbs, Peter H, Rees, Neil V, Robinson, Alex P. G, Tucker, James H. R

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Multi Trigger Resist for EUV Lithography von Popescu, Carmen, Vesters, Yannick, McClelland, Alexandra, De Simone, Danilo, Dawson, Guy, Roth, John, Theis, Wolfgang, Vandenberghe, Geert, Robinson, Alex P.G

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Charged particle single nanometre manufacturing von Prewett, Philip D, Hagen, Cornelis W, Lenk, Claudia, Lenk, Steve, Kaestner, Marcus, Ivanov, Tzvetan, Ahmad, Ahmad, Rangelow, Ivo W, Shi, Xiaoqing, Boden, Stuart A, Robinson, Alex P G, Yang, Dongxu, Hari, Sangeetha, Scotuzzi, Marijke, Huq, Ejaz

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A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist von Gibbons, Francis, Zaid, Hasnah M., Manickam, Mayandithevar, Preece, Jon A., Palmer, Richard E., Robinson, Alex P. G.

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Fullerene Resist Materials for the 32 nm Node and Beyond von Gibbons, Francis P., Robinson, Alex P. G., Palmer, Richard E., Diegoli, Sara, Manickam, Mayandithevar, Preece, Jon A.

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Novel Molecular Resist for EUV and Electron Beam Lithography von Frommhold, Andreas, Yang, Dongxu, McClelland, Alexandra, Roth, John, Xue, Xiang, Rosamund, Mark C., Linfield, Edmund H., Robinson, Alex P. G.

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Direct Electron-Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films von Gibbons, Francis P., Manickam, Mayandithevar, Preece, Jon A., Palmer, Richard E., Robinson, Alex P. G.

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Chemical Amplification of a Triphenylene Molecular Electron Beam Resist von Zaid, H. M., Robinson, A. P. G., Palmer, R. E., Manickam, M., Preece, J. A.

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Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography von Gibbons, Francis P., Robinson, Alex P. G., Palmer, Richard E., Manickam, Mayanditheuar, Preece, Jon A.

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Lamellar Orientation of Block Copolymer via Electron-beam Induced Polarity Switch in Nitrophenyl Self-assembled Monolayer von Yamamoto, Hiroki, Dawson, Guy, Robinson, Alex P.G., Kozawa, Takahiro

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Sensitivity Enhanced Photoresists von FROMMHOLD, Andreas, ROBINSON, Alex P.G, ROTH, John

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