Observation of Graphene Bubbles and Effective Mass Transport under Graphene Films von Stolyarova, E, Stolyarov, D, Bolotin, K, Ryu, S, Liu, L, Rim, K. T, Klima, M, Hybertsen, M, Pogorelsky, I, Pavlishin, I, Kusche, K, Hone, J, Kim, P, Stormer, H. L, Yakimenko, V, Flynn, G

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Influence of copper crystal surface on the CVD growth of large area monolayer graphene von Zhao, L., Rim, K.T., Zhou, H., He, R., Heinz, T.F., Pinczuk, A., Flynn, G.W., Pasupathy, A.N.

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Dissociative adsorption of CCl4 on the Fe3O4(111)-(2 x 2) selvedge of α-Fe2O3(0001) von ADIB, K, MULLINS, D. R, TOTIR, G, CAMILLONE, N. III, FITTS, J. P, RIM, K. T, FLYNN, G. W, OSGOOD, R. M

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CCl4 chemistry on the magnetite selvedge of single-crystal hematite: competitive surface reactions von ADIB, K, CAMILLONE, N. III, FITTS, J. P, RIM, K. T, FLYNN, G. W, JOYCE, S. A, OSGOOD, R. M

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Chemistry of CCl4 on Fe3O4(111)-(2×2) surfaces in the presence of adsorbed D2O studied by temperature programmed desorption von ADIB, K, TOTIR, G. G, FITTS, J. P, RIM, K. T, MUELLER, T, FLYNN, G. W, JOYCE, S. A, OSGOOD, R. M

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Visualizing Individual Nitrogen Dopants in Monolayer Graphene von Zhao, L., He, R., Rim, K. T., Schiros, T., Kim, K. S., Zhou, H., Gutierrez, C., Chockalingam, S. P., Arguello, C. J., Palova, L., Nordlund, D., Hybertsen, M. S., Reichman, D. R., Heinz, T. F., Kim, P., Pinczuk, A., Flynn, G. W., Pasupathy, A. N.

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Influence of copper crystal surface on the CVD growth of large area monolayer graphene von Zhao, L., Rim, K. T., Zhou, H., He, R., Heinz, T. F., Pinczuk, A., Flynn, G. W., Pasupathy, A. N.

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Selective Epitaxial Growth of Germanium on Si Wafers with Shallow Trench Isolation: An Approach for Ge Virtual Substrates von Wang, Gang, Leys, Frederik E., Souriau, Laurent, Loo, Roger, Caymax, Matty, Brunco, David P., Geypen, Jef, Bender, Hugo, Meuris, Marc, Vandervorst, Wilfried, Heyns, Marc M.

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Scanning Tunneling Microscopy and Theoretical Study of Competitive Reactions in the Dissociative Chemisorption of CCl4 on Iron Oxide Surfaces von Rim, Kwang Taeg, Müller, Thomas, Fitts, Jeffrey P, Adib, Kaveh, Camillone, Nicholas, Osgood, Richard M, Batista, Enrique R, Friesner, Richard A, Joyce, S. A, Flynn, George W

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CCl4 chemistry on the reduced selvedge of a α-Fe2O3(0001) surface: a scanning tunneling microscopy study von KWANG TAEG RIM, FITTS, Jeffrey P, MÜLLER, Thomas, ADIB, Kaveh, CAMILLONE, Nicholas III, OSGOOD, Richard M, JOYCE, S. A, FLYNN, George W

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Etch Rates of Ge, GaAs and InGaAs in Acids, Bases and Peroxide Based Mixtures von Sioncke, Sonja, Brunco, David P., Meuris, Marc, Uwamahoro, Olivier, Van Steenbergen, Jan, Vrancken, Evi, Heyns, Marc M.

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Surface termination dependence of the reactivity of single crystal hematite with CCl4 von CAMILLONE, Nicholas III, ADIB, Kaveh, FITTS, Jeffrey P, RIM, Kwang T, FLYNN, George W, JOYCE, S. A, OSGOOD, Richard M

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Temperature Dependence of the Product Branching Ratio of the CN + O 2 Reaction von Rim, Kwang Taeg, Hershberger, John F.

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Selective Epitaxial Growth of Ge-on-Si for Photodiode Applications von Kim, Meekyung, Olubuyide, Oluwamuyiwa, Yoon, Jung, Hoyt, Judy

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Generation of Realistic Amorphous Al2O3 And ZrO2 Samples By Hybrid Classical and First-Principle Molecular Dynamics Simulations von Chagarov, Evgueni, Kummel, Andrew C.

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A Diode Laser Study of the Product Branching Ratios of the CH + NO2 Reaction von Rim, Kwang Taeg, Hershberger, John F

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Chemical Vapor Deposition Epitaxy of Silicon-based Materials using Neopentasilane von Sturm, James C., Chung, Keith H.

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SiCP Selective Epitaxial Growth in Recessed Source/Drain Regions yielding to Drive Current Enhancement in n-channel MOSFET von Bauer, Matthias, Machkaoutsan, Vladimir, Zhang, Yangting, Weeks, Doran, Spear, Jennifer, Thomas, Shawn, Verheyen, Peter, Kerner, C., Clemente, F., Bender, Hugo, Shamiryan, D., Loo, Roger, Hikavyy, A., Hoffmann, T., Absil, Philipe, Biesemans, Serge

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Growth and Thermal Stability of SiGe/Si Superlattices on Bulk Si Wafers von Hartmann, Jean-Michel, Papon, Anne-Marie, Colonna, Jean-Philippe, Ernst, Thomas, Billon, Thierry

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Product Branching Ratios of the HCO + NO2 Reaction von Rim, Kwang Taeg, Hershberger, John F

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