IMPROVING CHEMISTRY UTILIZATION BY INCREASING PRESSURE DURING SUBSTRATE PROCESSING von BHIMARASETTI, Gopinath, RICHEY, Nathaniel Elba

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Improving chemistry utilization by increasing pressure during substrate processing von RICHEY, NATHANIEL ELBA, BHIMARASETTI, GOPINATH

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CONTROLLING GAS FLOWS IN PROCESSING TOOL von HOBERNICHT, Michael William, ROBERTS, Michael Philip, DUVALL, Andrew Kenichi, FISHER, Adam, KIM, Hyeongeu, BHIMARASETTI, Gopinath, LETOURNEAU, Steven Payonk, GUO, Tongtong, SCHLOSSER, William, RICHEY, Nathaniel Elba, WILTSE, John Michael

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DEPOSITION OF METAL-CONTAINING FILMS von MANDIA, David Joseph, SMITH, Joel David, NA, Jeong-Seok, GRIFFITHS, Matthew Bertram Edward, HAUSMANN, Dennis M, KANAKASABAPATHY, Sivananda Krishnan, AGNEW, Douglas Walter, BLAKENEY, Kyle Jordan, LAI, Chiukin Steven, FOX, Alexander Ray, RICHEY, Nathaniel Elba

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Controlling gas flows in processing tool von WILTSE, JOHN MICHAEL, RICHEY, NATHANIEL ELBA, KIM, HYEONGEU, SCHLOSSER, WILLIAM, DUVALL, ANDREW KENICHI, GUO, TONG-TONG, ROBERTS, MICHAEL PHILIP, BHIMARASETTI, GOPINATH, HOBERNICHT, MICHAEL WILLIAM, FISHER, ADAM, LETOURNEAU, STEVEN PAYONK

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Deposition of metal-containing films von BLAKENEY, KYLE JORDAN, NA, JEONG-SEOK, SMITH, JOEL DAVID, HAUSMANN, DENNIS M, MANDIA, DAVID JOSEPH, FOX, ALEXANDER RAY, RICHEY, NATHANIEL ELBA, GRIFFITHS, MATTHEW BERTRAM EDWARD, LAI, CHIUKIN STEVEN, KANAKASABAPATHY, SIVANANDA KRISHNAN, AGNEW, DOUGLAS WALTER

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