Development and characterization of degradable thiol-allyl ether photopolymers von Rydholm, Amber E., Reddy, Sirish K., Anseth, Kristi S., Bowman, Christopher N.

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Thiol−Ene Photopolymerization Mechanism and Rate Limiting Step Changes for Various Vinyl Functional Group Chemistries von Cramer, Neil B, Reddy, Sirish K, O'Brien, Allison K, Bowman, Christopher N

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Thiol−Allyl Ether−Methacrylate Ternary Systems. Polymerization Mechanism von Lee, Tai Yeon, Smith, Zachary, Reddy, Sirish K., Cramer, Neil B., Bowman, Christopher N.

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Initiation and kinetics of thiol-ene photopolymerizations without photoinitiators von Cramer, Neil B., Reddy, Sirish K., Cole, Michael, Hoyle, Charles, Bowman, Christopher N.

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Modeling of network degradation in mixed step-chain growth polymerizations von Reddy, Sirish K., Anseth, Kristi S., Bowman, Christopher N.

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Kinetic and Mechanistic Studies of Photopolymerizations of Acrylates in the Presence of Iniferters von Kilambi, Harini, Reddy, Sirish K, Bowman, Christopher N

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Polymer-Derived Ceramic Materials from Thiol-ene Photopolymerizations von Reddy, Sirish K, Cramer, Neil B, Cross, Tsali, Raj, Rishi, Bowman, Christopher N

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Rate mechanisms of a novel thiol-ene photopolymerization reaction von Reddy, Sirish K., Cramer, Neil B., O' Brien, Allison K., Cross, Tsali, Raj, Rishi, Bowman, Christopher N.

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Living radical photopolymerization induced grafting on thiol-ene based substrates von Reddy, Sirish K., Sebra, Robert P., Anseth, Kristi S., Bowman, Christopher N.

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Controlling Network Structure in Degradable Thiol-Acrylate Biomaterials to Tune Mass Loss Behavior von Rydholm, Amber E, Reddy, Sirish K, Anseth, Kristi S, Bowman, Christopher N

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VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS von REDDY, Sirish K, LAVOIE, Adrien, VARADARAJAN, Bhadri N, ANTONELLI, George Andrew, HAUSMANN, Dennis M, MARKS, Jeffrey, GOTTSCHO, Richard A, KNISLEY, Thomas Joseph, KOLICS, Artur

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VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS von Reddy, Sirish K, Hausmann, Dennis M, Knisley, Thomas Joseph, Gottscho, Richard A, Varadarajan, Bhadri N, Antonelli, George Andrew, Marks, Jeffrey, LaVoie, Adrien, Kolics, Artur

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Vacuum-integrated hardmask processes and apparatus von Reddy, Sirish K, Hausmann, Dennis M, Knisley, Thomas Joseph, Gottscho, Richard A, Varadarajan, Bhadri N, Antonelli, George Andrew, Marks, Jeffrey, LaVoie, Adrien, Kolics, Artur

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Image reversal with AHM gap fill for multiple patterning von Reddy, Sirish K, van Schravendijk, Bart J, Shamma, Nader, Ji, Chunhai

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Vacuum-integrated hardmask processes and apparatus von Reddy, Sirish K, Hausmann, Dennis M, Knisley, Thomas Joseph, Gottscho, Richard A, Varadarajan, Bhadri N, Antonelli, George Andrew, Marks, Jeffrey, LaVoie, Adrien, Kolics, Artur

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Sulfur doped carbon hard masks von REDDY SIRISH K, LILL THORSTEN, HOLLISTER ALICE G

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High aspect ratio etch of oxide metal oxide metal stack von Lill, Thorsten, Reddy, Sirish K, Eppler, Aaron, Chattopadhyay, Kaushik, Singh, Harmeet, Guha, Joydeep, Vahedi, Vahid, Mountsier, Thomas W

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Vacuum-integrated hardmask processes and apparatus von Reddy, Sirish K, Hausmann, Dennis M, Knisley, Thomas Joseph, Gottscho, Richard A, Varadarajan, Bhadri N, Antonelli, George Andrew, Marks, Jeffrey, LaVoie, Adrien, Kolics, Artur

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HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK von REDDY, Sirish K, SINGH, Harmeet, LILL, Thorsten, GUHA, Joydeep, EPPLER, Aaron, VAHEDI, Vahid, CHATTOPADHYAY, Kaushik, MOUNTSIER, Thomas W

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HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK von REDDY, Sirish K, SINGH, Harmeet, LILL, Thorsten, GUHA, Joydeep, EPPLER, Aaron, VAHEDI, Vahid, CHATTOPADHYAY, Kaushik, MOUNTSIER, Thomas W

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