Lithographically Defined Porous Carbon Electrodes von Burckel, D. Bruce, Washburn, Cody M., Raub, Alex K., Brueck, Steven R. J., Wheeler, David R., Brozik, Susan M., Polsky, Ronen

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Integration of block copolymer directed assembly with 193 immersion lithography von Liu, Chi-Chun, Nealey, Paul F., Raub, Alex K., Hakeem, Philip J., Brueck, Steve R. J., Han, Eungnak, Gopalan, Padma

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Large area three-dimensional photonic crystals with embedded waveguides von Raub, Alex K., Brueck, S. R. J.

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Pyrolytic carbon electrodes: Small 24/2009 von Burckel, D. Bruce, Washburn, Cody M., Raub, Alex K., Brueck, Steven R. J., Wheeler, David R., Brozik, Susan M., Polsky, Ronen

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Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography von Raub, Alex K., Frauenglass, A., Brueck, S. R. J., Conley, Will, Dammel, Ralph, Romano, Andy, Sato, Mitsuru, Hinsberg, William

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Fabrication of 22 nm half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling von Raub, Alex K., Li, Dong, Frauenglass, Andrew, Brueck, S. R. J.

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Nanotool processes and applications von BRUECK STEVEN R.J, RAUB ALEX

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Fabrication of 22nm half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling von Raub, Alex K., Li, Dong, Frauenglass, Andrew, Brueck, S. R. J.

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LARGE AREA PATTERNING USING INTERFEROMETRIC LITHOGRAPHY von FRAUENGLASS ANDREW, BRUECK STEVEN R. J, RAUB ALEX

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