Charge state optimisation for beryllium accelerator mass spectrometry von Gonsalves, Basil C., Mizohata, Kenichiro, Tikkanen, Pertti O., Räisänen, Jyrki A.

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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics von Mattinen, Miika, Popov, Georgi, Vehkamäki, Marko, King, Peter J, Mizohata, Kenichiro, Jalkanen, Pasi, Räisänen, Jyrki, Leskelä, Markku, Ritala, Mikko

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Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films von Mäkelä, Maarit, Hatanpää, Timo, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Effect of interstitial carbon on the evolution of early-stage irradiation damage in equi-atomic FeMnNiCoCr high-entropy alloys von Lu, Eryang, Makkonen, Ilja, Mizohata, Kenichiro, Li, Zhiming, Räisänen, Jyrki, Tuomisto, Filip

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Magnetism in Nanocrystalline Gold von Tuboltsev, Vladimir, Savin, Alexander, Pirojenko, Alexandre, Räisänen, Jyrki

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Studies on Thermal Atomic Layer Deposition of Silver Thin Films von Mäkelä, Maarit, Hatanpää, Timo, Mizohata, Kenichiro, Meinander, Kristoffer, Niinistö, Jaakko, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices von Kim, Jiyeon, Iivonen, Tomi, Hämäläinen, Jani, Kemell, Marianna, Meinander, Kristoffer, Mizohata, Kenichiro, Wang, Lidong, Räisänen, Jyrki, Beranek, Radim, Leskelä, Markku, Devi, Anjana

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Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine von Väyrynen, Katja, Mizohata, Kenichiro, Räisänen, Jyrki, Peeters, Daniel, Devi, Anjana, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of PbS Thin Films at Low Temperatures von Popov, Georgi, Bačić, Goran, Mattinen, Miika, Manner, Toni, Lindström, Hannu, Seppänen, Heli, Suihkonen, Sami, Vehkamäki, Marko, Kemell, Marianna, Jalkanen, Pasi, Mizohata, Kenichiro, Räisänen, Jyrki, Leskelä, Markku, Koivula, Hanna Maarit, Barry, Seán T, Ritala, Mikko

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Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films von Väyrynen, Katja, Hatanpää, Timo, Mattinen, Miika, Heikkilä, Mikko, Mizohata, Kenichiro, Meinander, Kristoffer, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors von Mäntymäki, Miia, Heikkilä, Mikko J, Puukilainen, Esa, Mizohata, Kenichiro, Marchand, Benoît, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Metallization of self-assembled organic monolayer surfaces by Pd nanocluster deposition von Venäläinen, Annika, Meinander, Kristoffer, Räisänen, Minna, Tuboltsev, Vladimir, Räisänen, Jyrki

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Optical characteristics of virgin and proton-irradiated ceramics of magnesium aluminate spinel von Feldbach, Eduard, Kudryavtseva, Irina, Mizohata, Kenichiro, Prieditis, Gatis, Räisänen, Jyrki, Shablonin, Evgeni, Lushchik, Aleksandr

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Radiation resistance diagnostics of wide-gap optical materials von Feldbach, Eduard, Tõldsepp, Eliko, Kirm, Marco, Lushchik, Aleksandr, Mizohata, Kenichiro, Räisänen, Jyrki

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Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low‐Temperature Film Growth von Mattinen, Miika, Hatanpää, Timo, Sarnet, Tiina, Mizohata, Kenichiro, Meinander, Kristoffer, King, Peter J., Khriachtchev, Leonid, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Prope... von Mattinen, Miika, Wree, Jan-Lucas, Stegmann, Niklas, Ciftyurek, Engin, Achhab, Mhamed El, King, Peter J, Mizohata, Kenichiro, Räisänen, Jyrki, Schierbaum, Klaus D, Devi, Anjana, Ritala, Mikko, Leskelä, Markku

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Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition von Mattinen, Miika, Hämäläinen, Jani, Gao, Feng, Jalkanen, Pasi, Mizohata, Kenichiro, Räisänen, Jyrki, Puurunen, Riikka L, Ritala, Mikko, Leskelä, Markku

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Nickel Germanide Thin Films by Atomic Layer Deposition von Väyrynen, Katja, Vihervaara, Anton, Hatanpää, Timo, Mattinen, Miika, Heikkilä, Mikko J, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of Rhenium Disulfide von Hämäläinen, Jani, Mattinen, Miika, Mizohata, Kenichiro, Meinander, Kristoffer, Vehkamäki, Marko, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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Atomic Layer Deposition of Photoconductive Cu2O Thin Films von Iivonen, Tomi, Heikkilä, Mikko J, Popov, Georgi, Nieminen, Heta-Elisa, Kaipio, Mikko, Kemell, Marianna, Mattinen, Miika, Meinander, Kristoffer, Mizohata, Kenichiro, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

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