PREVAIL e-beam stepper alpha tool von Pfeiffer, H.C., Dhaliwal, R.S., Golladay, S.D., Doran, S.K., Gordon, M.S., Kendall, R.A., Lieberman, J.E., Pinckney, D.J., Quickle, R.J., Robinson, C.F., Rockrohr, J.D., Stickel, W., Tressler, E.V., Tanimoto, A., Yamaguchi, T., Okamoto, K., Suzuki, K., Miura, T., Okino, T., Kawata, S., Morita, K., Suzuki, S.C., Shimizu, H., Kojima, S., Varnell, G., Novak, W.T., Sogard, M.

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Projection reduction exposure with variable axis immersion lenses: Next generation lithography von Pfeiffer, H. C., Dhaliwal, R. S., Golladay, S. D., Doran, S. K., Gordon, M. S., Groves, T. R., Kendall, R. A., Lieberman, J. E., Petric, P. F., Pinckney, D. J., Quickle, R. J., Robinson, C. F., Rockrohr, J. D., Senesi, J. J., Stickel, W., Tressler, E. V., Tanimoto, A., Yamaguchi, T., Okamoto, K., Suzuki, K., Okino, T., Kawata, S., Morita, K., Suziki, S. C., Shimizu, H., Kojima, S., Varnell, G., Novak, W. T., Stumbo, D. P., Sogard, M.

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Perceived Self-Regulation and Individual Differences in Selective Attention von Diefendorff, James M, Lord, Robert G, Hepburn, Emily T, Quickle, Joseph S, Hall, Rosalie J, Sanders, Raymond E

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