The study of GaAs reactive ion etching in Cl2/Ar von Dulkin, AE, Pyataev, VZ, Sokolova, NO, Moshkalyov, SA, Smirnov, AS, Frolov, KS

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III–V compound semiconductor reactive ion etching in chlorine and methane containing mixtures von Dulkin, A.E., Moshkalyov, S.A., Pyataev, V.Z., Smirnov, A.S., Frolov, K.S.

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The study of GaAs reactive ion etching in Cl 2/Ar von Dulkin, AE, Pyataev, VZ, Sokolova, NO, Moshkalyov, SA, Smirnov, AS, Frolov, KS

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