Fabrication and Optical Properties of Erbium-Doped Germanium Nanowires von Wu, J., Punchaipetch, P., Wallace, R. M., Coffer, J. L.

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Hafnium silicate formation by ultra-violet/ozone oxidation of hafnium silicide von Punchaipetch, P, Pant, G, Quevedo-Lopez, M, Zhang, H, El-Bouanani, M, Kim, M.J, Wallace, R.M, Gnade, B.E

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Epoxy+liquid crystalline epoxy coreacted networks: I. Synthesis and curing kinetics von Punchaipetch, P, Ambrogi, V, Giamberini, M, Brostow, W, Carfagna, C, D'Souza, N.A

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Low-temperature deposition of hafnium silicate gate dielectrics von Punchaipetch, P., Pant, G., Quevedo-Lopez, M.A., Yao, C., El-Bouanani, M., Kim, M.J., Wallace, R.M., Gnade, B.E.

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Hydrogen and deuterium incorporation and transport in hafnium-based dielectric films on silicon von Pezzi, R. P., Miotti, L., Bastos, K. P., Soares, G. V., Driemeier, C., Baumvol, I. J. R., Punchaipetch, P., Pant, G., Gnade, B. E., Wallace, R. M., Rotondaro, A., Visokay, J. M., Chambers, J. J., Colombo, L.

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Atomic transport and chemical stability of nitrogen in ultrathin HfSiON gate dielectrics von DRIEMEIER, C, BASTOS, K. P, SOARES, G. V, MIOTTI, L, PEZZI, R. P, BAUMVOL, I. J. R, PUNCHAIPETCH, P, PANT, G, GNADE, B. E, WALLACE, R. M

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Epoxy+liquid crystalline epoxy coreacted networks: II. Mechanical properties von Punchaipetch, Prakaipetch, Ambrogi, Veronica, Giamberini, Marta, Brostow, Witold, Carfagna, Cosimo, D'Souza, Nandika Anne

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Low temperature UV/ozone oxidation formation of HfSiON gate dielectric von Pant, Gaurang, Punchaipetch, Prakaipetch, Kim, M.J., Wallace, Robert M., Gnade, Bruce E.

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Improving High-κ Gate Dielectric Properties by High-Pressure Water Vapor Annealing von Punchaipetch, Prakaipetch, Miyashita, Makoto, Uraoka, Yukiharu, Fuyuki, Takashi, Sameshima, Toshiyuki, Horii, Sadayoshi

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Electron Injection into Si Nanodot Fabricated by Side-Wall Plasma Enhanced Chemical Vapor Deposition von Ichikawa, Kazunori, Punchaipetch, Prakaipetch, Yano, Hiroshi, Hatayama, Tomoaki, Uraoka, Yukiharu, Fuyuki, Takashi, Takahashi, Eiji, Hayashi, Tsukasa, Ogata, Kiyoshi

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Growth and characterization of hafnium silicate films prepared by UV/ozone oxidation von Punchaipetch, Prakaipetch, Pant, Gaurang, Kim, M. J., Wallace, Robert M., Gnade, Bruce E.

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Mechanical properties of glass fiber composites with an epoxy resin modified by a liquid crystalline epoxy von Punchaipetch, Prakaipetch, D'Souza, Nandika Anne, Brostow, Witold, Smith Sr, James T.

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Epoxy+liquid crystalline epoxy corrected networks: I. Synthesis and curing kinetics von Punchaipetch, P, Ambrogi, V, Giamberini, M, Brostow, W, Carfagna, C, D'Souza, N A

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Effects of glass fibers and polypropylene/glass fiber hybrid fibers on the kinetics and mechanical properties of epoxy composites von Punchaipetch, Prakaipetch, D'Souza, Nandika Anne, Brostow, Witold, Akinay, Ali E., Reed, Jonathan

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Low temperature deposition of hafnium silicate gate dielectrics for TFTs on plastic substrates von Gnade, B.E., Pant, G., Punchaipetch, P., Wallace, R.M.

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X-ray photoelectron spectroscopy study of electrodeposited nanostructured CeO2 films von Wang, Adele Qi, Punchaipetch, Prakaipetch, Wallace, Robert M., Golden, Teresa Diane

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Low temperature nitridation of PLCVD HfSi/sub x/O/sub y/ gate dielectrics using nitrogen radicals von Nakamura, H., Punchaipetch, P., Yano, H., Hatayama, T., Uraoka, Y., Fuyuki, T., Horii, S.

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