Surface characterization of TiO2 thin films obtained by high-energy reactive magnetron sputtering von WASIELEWSKI, R, DOMARADZKI, J, WOJCIESZAK, D, KACZMAREK, D, BORKOWSKA, A, PROCIOW, E. L, CISZEWSKI, A

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Photoluminescence of Eu-doped TiO2 thin films prepared by low pressure hot target magnetron sputtering von PROCIOW, E. L, DOMARADZKI, J, PODHORODECKI, A, BORKOWSKA, A, KACZMAREK, D, MISIEWICZ, J

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Microstructure and optical properties of TiO2 thin films prepared by low pressure hot target reactive magnetron sputtering von DOMARADZKI, J, KACZMAREK, D, PROCIOW, E. L, BORKOWSKA, A, SCHMEISSER, D, BEUCKERT, G

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Switching properties of vanadium doped TiO 2 thin films prepared by magnetron sputtering von Domaradzki, J., Kaczmarek, D., Prociow, E.L.

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Switching properties of vanadium doped TiO2 thin films prepared by magnetron sputtering von Domaradzki, J., Kaczmarek, D., Prociow, E.L.

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Structural investigations of TiO2:Tb thin films by X-ray diffraction and atomic force microscopy von KACZMAREK, D, DOMARADZKI, J, WOJCIESZAK, D, WASIELEWSKI, R, BORKOWSKA, A, PROCIOW, E. L, CISZEWSKI, A

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Excitation mechanism of europium ions embedded into TiO2 nanocrystalline matrix von PODHORODECKI, A, ZATRYB, G, SITAREK, P, MISIEWICZ, J, KACZMAREK, D, DOMARADZKI, J, BORKOWSKA, A, PROCIOW, E. L

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Characterization of nanocrystalline TiO2-HfO2 thin films prepared by low pressure hot target reactive magnetron sputtering von DOMARADZKI, J, KACZMAREK, D, PROCIOW, E. L, BORKOWSKA, A, KUDRAWIEC, R, MISIEWICZ, J, SCHMEISSER, D, BEUCKERT, G

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Study of Structure Densification in TiO 2 Coatings Prepared by Magnetron Sputtering under Low Pressure of Oxygen Plasma Discharge von Domaradzki, J., Kaczmarek, D., Prociow, E.L., Radzimski, Z.J.

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Excitation mechanism of europium ions embedded into TiO 2 nanocrystalline matrix von Podhorodecki, A., Zatryb, G., Sitarek, P., Misiewicz, J., Kaczmarek, D., Domaradzki, J., Borkowska, A., Prociow, E.L.

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Electrical characterisation of structures consisting of Ti–V–Pd thin film oxide on silicon by impedance spectroscopy von Domaradzki, J., Nitsch, K., Prociow, E.L., Kaczmarek, D., Paszkiewicz, B.

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Structural investigations of TiO 2:Tb thin films by X-ray diffraction and atomic force microscopy von Kaczmarek, D., Domaradzki, J., Wojcieszak, D., Wasielewski, R., Borkowska, A., Prociow, E.L., Ciszewski, A.

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Surface characterization of TiO 2 thin films obtained by high-energy reactive magnetron sputtering von Wasielewski, R., Domaradzki, J., Wojcieszak, D., Kaczmarek, D., Borkowska, A., Prociow, E.L., Ciszewski, A.

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Thin Films Based on Nanocrystalline TiO 2 for Transparent Electronics von Prociow, E.L., Sieradzka, K., Domaradzki, J., Kaczmarek, D., Mazur, M.

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X-ray, optical and electrical characterization of doped nanocrystalline titanium oxide thin films von Domaradzki, J, Prociow, E.L, Kaczmarek, D, Berlicki, T, Podhorodecki, A, Kudrawiec, R, Misiewicz, J

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Photoluminescence of Eu-doped TiO 2 thin films prepared by low pressure hot target magnetron sputtering von Prociow, E.L., Domaradzki, J., Podhorodecki, A., Borkowska, A., Kaczmarek, D., Misiewicz, J.

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Study of electrical and optical properties of CN x thin films deposited by reactive magnetron sputtering von Prociów, E.L., Chodzinski, T.

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Microstructure and optical properties of TiO 2 thin films prepared by low pressure hot target reactive magnetron sputtering von Domaradzki, J., Kaczmarek, D., Prociow, E.L., Borkowska, A., Schmeisser, D., Beuckert, G.

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Study of electrical and optical properties of CNx thin films deposited by reactive magnetron sputtering von PROCIOW, E. L, CHODZINSKI, T

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Characterization of nanocrystalline TiO 2–HfO 2 thin films prepared by low pressure hot target reactive magnetron sputtering von Domaradzki, J., Kaczmarek, D., Prociow, E.L., Borkowska, A., Kudrawiec, R., Misiewicz, J., Schmeisser, D., Beuckert, G.

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