Selected properties of AlxZnyO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target von Posadowski, Witold, Wiatrowski, Artur, Domaradzki, Jaroslaw, Mazur, Michal

Volltext

Electrical characterization of aluminium oxide–aluminium thin film composites by impedance spectroscopy von Tadaszak, Katarzyna, Nitsch, Karol, Piasecki, Tomasz, Posadowski, Witold M.

Volltext

Effect of sputtering power and oxygen partial pressure on structural and opto-electronic properties of Al-doped ZnO transparent conducting oxides von Kiliszkiewicz, Milena, Domaradzki, Jarosław, Posadowski, Witold, Mazur, Michał, Wiatrowski, Artur, Dawidowski, Wojciech, Mazur, Piotr, Wojcieszak, Damian, Chodasewicz, Paweł, Bartczak, Mateusz

Volltext

Selected properties of Al x Zn y O thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target von Posadowski, Witold, Wiatrowski, Artur, Domaradzki, Jarosław, Mazur, Michał

Volltext

Anodic Bonding of Glass-to-Glass through Magnetron Spattered Nanometric Silicon Layer von Knapkiewicz, Pawel, Cichy, Bartlomiej, Posadowski, Witold, Tadaszak, Katarzyna, Sniadek, Patrycja, Dziuban, Jan

Volltext

A Comprehensive Investigation of the Mechanical and Tribological Properties of AZO Transparent Conducting Oxide Thin Films Deposited by Medium Frequency Magnetron Sputtering von Mazur, Michał, Kiliszkiewicz, Milena, Posadowski, Witold, Domaradzki, Jarosław, Małachowska, Aleksandra, Sokołowski, Paweł

Volltext

Investigation of the Microstructure, Optical, Electrical and Nanomechanical Properties of ZnOx Thin Films Deposited by Magnetron Sputtering von Mazur, Michał, Obstarczyk, Agata, Posadowski, Witold, Domaradzki, Jarosław, Kiełczawa, Szymon, Wiatrowski, Artur, Wojcieszak, Damian, Kalisz, Małgorzata, Grobelny, Marcin, Szmidt, Jan

Volltext

Effective reactive pulsed magnetron sputtering of aluminium oxide – Properties of films deposited utilizing automated process stabilizer von Wiatrowski, Artur, Patela, Sergiusz, Kunicki, Piotr, Posadowski, Witold

Volltext

Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide von Posadowski, Witold, Wiatrowski, Artur, Kapka, Grzegorz

Volltext

Properties of Metallic and Oxide Thin Films Based on Ti and Co Prepared by Magnetron Sputtering from Sintered Targets with Different Co-Content von Wojcieszak, Damian, Mazur, Michal, Pokora, Patrycja, Wrona, Adriana, Bilewska, Katarzyna, Kijaszek, Wojciech, Kotwica, Tomasz, Posadowski, Witold, Domaradzki, Jaroslaw

Volltext

Electron emission from the zirconium coated suspension plasma sprayed bioglass von Znamirowski, Zbigniew, Posadowski, Witold, Pawłowski, Lech, Cattini, Andrea, Łatka, Leszek

Volltext

Self-sustained magnetron co-sputtering of Cu and Ni von Posadowski, Witold Michał

Volltext

Studies of medium frequency high power density magnetron sputtering discharges von Brudnik, Andrzej, Czapla, Adam, Posadowski, Witold

Volltext

Low pressure magnetron sputtering using ionized, sputtered species von Posadowski, Witold

Volltext

Electric properties of Ti-Si-N thin cermet films deposited in a triode sputtering system with a hot cathode von Posadowski, Witold

Volltext

Properties of silicon nitride thin films obtained by reactive sputtering von Posadowski, Witold

Volltext

The manner of obtaining of layers by means of impulse process of magnetic sprinkling von WIATROWSKI ARTUR, POSADOWSKI WITOLD

Volltext bestellen

METHOD OF COOLING A MAGNETRON TARGET von POSADOWSKI WITOLD

Volltext bestellen

Miniature field emission light sources associated with silicon-glass microcytometer for measurements of quality of oocytes von Cichy, B., Gorecka-Drzazga, A., Szczepanska, P., Walczak, R., Posadowski, W., Dziuban, J.A.

Volltext

Quality of PCB Interconnections Based on Blind Microvias Metallized by Magnetron Sputtering Deposition von Borecki, J., Felba, J., Posadowski, W.M.

Volltext