Magnetron sputtering process control by medium-frequency power supply parameter von Posadowski, W.M., Wiatrowski, A., Dora, J., Radzimski, Z.J.

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Magnetron sputtering modes during pulsed deposition process determined by the analysis of power supply parameter von Krówka, K., Wiatrowski, A., Posadowski, W.M.

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Deposition of diamond-like carbon thin films by the high power impulse magnetron sputtering method von Wiatrowski, A., Kijaszek, W., Posadowski, W.M., Oleszkiewicz, W., Jadczak, J., Kunicki, P.

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Plasma parameters of very high target power density magnetron sputtering von Posadowski, W.M

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Standard and self-sustained magnetron sputtering deposited Cu films investigated by means of AFM and XRD von Wiatrowski, A., Posadowski, W.M., Jóźwiak, G., Serafińczuk, J., Szeloch, R., Gotszalk, T.

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Corrigendum to "Microscopic Examination of Cold Spray Cermet Sn+In 2 O 3 Coatings for Sputtering Target Materials" von Winnicki, M, Baszczuk, A, Rutkowska-Gorczyca, M, Jasiorski, M, Małachowska, A, Posadowski, W, Znamirowski, Z, Ambroziak, A

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Microscopic Examination of Cold Spray Cermet Sn+In 2 O 3 Coatings for Sputtering Target Materials von Winnicki, M, Baszczuk, A, Rutkowska-Gorczyca, M, Jasiorski, M, Małachowska, A, Posadowski, W, Znamirowski, Z, Ambroziak, A

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Corrigendum to “Microscopic Examination of Cold Spray Cermet Sn+In2O3 Coatings for Sputtering Target Materials” von Ambroziak, Andrzej, Znamirowski, Z., Małachowska, A., Jasiorski, M., Rutkowska-Gorczyca, Małgorzata, Baszczuk, A., Winnicki, Marcin, Posadowski, W.

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Microscopic Examination of Cold Spray Cermet Sn+In2O3 Coatings for Sputtering Target Materials von Ambroziak, Andrzej, Posadowski, W., Małachowska, A., Jasiorski, M., Rutkowska-Gorczyca, Małgorzata, Baszczuk, A., Winnicki, Marcin, Znamirowski, Z.

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Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process von Tadaszak, K., Nitsch, K., Piasecki, T., Posadowski, W. M.

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Self-sustained magnetron co-sputtering of Cu and Ni von Posadowski, Witold Michał

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Pulsed magnetron sputtering of reactive compounds von Posadowski, W.M.

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Pulsed-DC selfsputtering of copper von Wiatrowski, A, Posadowski, W M, Radzimski, Z J

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The impact of medium frequency pulsed magnetron discharge power on the single probe Langmuir measurements and resulted plasma parameters von Wiatrowski, A, Posadowski, W.M

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Reactively sputtered TiO2−x thin films with plasma-emission-controlled departure from stoichiometry von Zakrzewska, K., Brudnik, A., Radecka, M., Posadowski, W.

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Sustained self sputtering of different materials using dc magnetron von Posadowski, WM

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Optical emission spectroscopy of self-sustained magnetron sputtering von Posadowski, W.M., Brudnik, A.

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Pulsed dc self-sustained magnetron sputtering von Wiatrowski, A., Posadowski, W. M., Radzimski, Z. J.

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Preparation of thermosensitive magnetron sputtered thin films von Beensh-Marchwicka, G., Prociów, E., Posadowski, W.

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Optical Emission Spectroscopy in High Target Powder Density Magnetron Source von Czapla, A., Posadowski, W., Brudnik, A.

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