Synchrotron microbeam x-ray radiation damage in semiconductor layers von Polvino, Sean M., Murray, Conal E., Kalenci, Özgür, Noyan, I. C., Lai, Barry, Cai, Zhoghou

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Non-destructive dielectric layer thickness and dopant measuring method von Polvino Sean M, Kohli Kriteshwar K

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NON-DESTRUCTIVE DIELECTRIC LAYER THICKNESS AND DOPANT MEASURING METHOD von Polvino Sean M, Kohli Kriteshwar K

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Multiple thickness gate dielectrics for replacement gate field effect transistors von RAMACHANDRAN RAVIKUMAR, LAI WING L, POLVINO SEAN M, NARAYANAN VIJAY, SIDDIQUI SHAHAB, KWON UNOH

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Multi-layer work function metal replacement gate von DASGUPTA ARITRA, ANDO TAKASHI, POLVINO SEAN M, KWON UNOH

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Multiple thickness gate dielectrics for replacement gate field effect transistors von RAMACHANDRAN RAVIKUMAR, LAI WING L, POLVINO SEAN M, NARAYANAN VIJAY, SIDDIQUI SHAHAB, KWON UNOH

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