Polysulfone based non-CA resists for 193 nm immersion lithography: Effect of increasing polymer absorbance on sensitivity von Chen, Lan, Goh, Yong-Keng, Lawrie, Kirsten, Chuang, Yami, Piscani, Emil, Zimmerman, Paul, Blakey, Idriss, Whittaker, Andrew K.

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Polysulfone based non-CA resists for 193nm immersion lithography: Effect of increasing polymer absorbance on sensitivity von Chen, Lan, Goh, Yong-Keng, Lawrie, Kirsten, Chuang, Yami, Piscani, Emil, Zimmerman, Paul, Blakey, Idriss, Whittaker, Andrew K.

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Magnetic properties of stage-2 random-mixture graphite intercalation compounds and their bulk intercalants von Suzuki, Itsuko S., Piscani, Emil C., Suzuki, Masatsugu

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Oxygen contamination of low temperature ultrahigh vacuum-deposited Ge films on GaAs von Dubey, Madan, Lareau, Richard T., Cole, Melanie W., Jones, Kenneth A., West, Lawrence C., Roberts, Charles W., Piscani, Emil

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Fast Opto-Electronic Quantum Well Amplitude Modulator. Version 0.0 von West, Larry C, Roberts, Charlie W, Piscani, Emil C

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Three Dimensional Packaging of Very Large Scale Integrated Optics (VLSIO) for High Complexity Optical Systems von West, Lawrence C, Roberts, Charles W, Piscani, Emil C, Dubey, Madan, Jones, Kenneth A

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