AlInAsSb avalanche photodiodes on InP substrates von Kodati, S. H., Lee, S., Guo, B., Jones, A. H., Schwartz, M., Winslow, M., Pfiester, N. A., Grein, C. H., Ronningen, T. J., Campbell, J. C., Krishna, S.

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Optical constants of Al0.85Ga0.15As0.56Sb0.44 and Al0.79In0.21As0.74Sb0.26 von Guo, B., Jones, A. H., Lee, S., Kodati, S. H., Liang, B., Xue, X., Pfiester, N. A., Schwartz, M., Winslow, M., Grein, C. H., Ronningen, T. J., Krishna, S., Campbell, J. C.

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Localized Acquired Hypertrichosis After Cast Treatment in Pediatric and Adolescent Patients: A Natural History Study von Pfiester, Mary P., Eismann, Emily A., Wilson, Lindsay M., Parikh, Shital N.

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The binding of iron and zinc to glyoxalase II occurs exclusively as di-metal centers and is unique within the metallo-beta-lactamase family von Wenzel, Nathan F, Carenbauer, Anne L, Pfiester, Mary Pam, Schilling, Oliver, Meyer-Klaucke, Wolfram, Makaroff, Christopher A, Crowder, Michael W

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An ITLDD CMOS process with self-aligned reverse-sequence LDD/channel implantation von Pfiester, J.R., Sivan, R.D., Gunderson, C.D., Crain, N.E., Lin, J.-H., Liaw, H.M., Seelbach, C.A., Baker, F.K.

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A selectively deposited poly-gate ITLDD process with self-aligned LDD/channel implantation von Pfiester, J.R., Baker, F.K., Sivan, R.D., Crain, N., Lin, J.-H., Liaw, M., Seelbach, C., Gunderson, C., Denning, D.

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A poly-framed LDD sub-half-micrometer CMOS technology von Pfiester, J.R., Crain, N., Lin, J.-H., Gunderson, C.D., Kaushik, V.

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A self-aligned LDD/channel implanted ITLDD process with selectively-deposited poly gates for CMOS VLSI von Pfiester, J.R., Baker, F.K., Sivan, R.D., Crain, N., Lin, H.-H., Liaw, M., Seelbach, C., Gunderson, C., Denning, D.

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IGFET DECODE CIRCUIT USING SERIES-COUPLED TRANSISTORS von PFIESTER J, MCALLISTER D

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IGFET DECODER CIRCUIT USING SERIES-COUPLED TRANSISTORS von PFIESTER, JAMES RUHL, MCALLISTER, DOYLE VERNON

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