Plasma altered layer model for plasma damage characterization of porous OSG films von Shi, H., Huang, H., Bao, J., Im, J., Ho, P.S., Zhou, Y., Pender, J.T., Armacost, M., Kyser, D.

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Correlating Plasma Emissivity And Etch Depth von Buie, M.J., Pender, J.T., Spindler, H.L., Soniker, J., Brake, M.L., Elta, M.

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Modern research and development in SF6 switchgear von Tedford, D.J., Campbell, L.C., Pender, J.T.

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