Effective EUV Resist Outgassing Barrier Using a Novel Top Coat Material von Wang, Xiaowei, Pawlowski, Georg, Okayasu, Tetsuo, Suzuki, Masato, Hama, Yusuke, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo

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Materials for Optical Data Storage von Emmelius, Michael, Pawlowski, Georg, Vollmann, Hansjörg W.

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The Frog Prince: A Brief Review of DUV Resist Technology von Lee, DongKwan, Pawlowski, Georg

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Polymer Optimization of Pigmented Photoresists for Color Filter Production von Kudo, Takanori, Nanjo, Yuki, Nozaki, Yuko, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg

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Third-order nonlinear optical properties of porphyrazine, phthalocyanine and naphthalocyanine germanium derivatives: Demonstrating the effect of π-conjugation length on third-order... von Nalwa, Hari Singh, Hanack, Michael, Pawlowski, Georg, Engel, Michael Klaus

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COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION METHOD USING SAME von OKAYASU TETSUO, WANG XIAOWEI, PAWLOWSKI GEORG, SUZUKI MASATO, TETSUO OKAYASU, GEORG PAWLOWSKI, XIAOWEI WANG, MASATO SUZUKI

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AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME von ERI HIRAHARA, PAWLOWSKI, GEORG, DAMMEL, RALPH, GEORG PAWLOWSKI, HIRAHARA, ERI, RALPH DAMMEL

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Optimization of DUV Negative Resists for 0.15 .MU.m Lithography von Kudo, Takanori, Aramaki, Kayo, Pawlowski, Georg

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Fabrication Process of Color Filters Using Pigmented Photoresists von Kudo, Takanori, Nanjo, Yuki, Yamaguchi, Yuko, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg

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PIGMENTED PHOTORESISTS FOR COLOR FILTERS von Kudo, Takanori, Nanjo, Yuki, Nozaki, Yuko, Nagao, Kazuya, Yamaguchi, Hidemasa, Kang, Wen-Bing, Pawlowski, Georg

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The Frog Prince von Lee, DongKwan, Pawlowski, Georg

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RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME von PAWLOWSKI Georg, WANG Xiaowei, MATSUURA Yuriko

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PIGMENTED PHOTORESIST FOR BLACK MATRIX von Kudo, Takanori, Nozaki, Yuko, Nanjo, Yuki, Yamaguchi, Hidemasa, Nagao, Kazuya, Okazaki, Hiroshi, Pawlowski, Georg

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Bottom Anti-Reflective Coatings for DUV Lithography von Kang, Wen-Bing, Tanaka, Hatsuyuki, Kimura, Ken, Padmanaban, Munirathna, Funato, Satoru, Kinoshita, Yoshiaki, Kudo, Takanori, Nozaki, Yuko, Pawlowski, Georg

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CHEMICAL AMPLIFICATION & DISSOLUTION INHIBITION: A NOVEL HIGH PERFORMANCE POSITIVE TONE DEEP UV RESIST von PAWLOWSKI, GEORG, PRZYBILLA, KLAUS-JÜRGEN, SPIESS, WALTER, WENGENROTH, HORST, RÖSCHERT, HORST

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NEGATIVE PHOTORESIST COMPOSITIONS von PLASS, Robert, OBERLANDER, Joseph, PAWLOWSKI, Georg, CHEN, Chunwei

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Leaching Phenomena and their Suppresion in 193 nm Immersion Lithography von Dammel, Ralph R., Pawlowski, Georg, Romano, Andrew, Hoolihan, Frank M., Kim, Woo-Kyu, Sakmuri, Raj, Abdallah, David, Padmanaban, Murirathna, Rahman, M. Dalil, McKenzie, Douglas

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NEW t-BOC BLOCKED POLYMERS FOR ADVANCED LITHOGRAPHIC APPLICATIONS von PRZYBILLA, KLAUS-JÜRGEN, DAMMEL, RALPH, RÖSCHERT, HORST, SPIESS, WALTER, PAWLOWSKI, GEORG

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A novel two component positive photoresist for deep UV lithography von Pawlowski, Georg, Dammel, Ralph, Lindley, Charlet R., Merrem, Hans-Joachim, Röschert, Heinz, Wilharm, Peter

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COMPOSITION AND USE OF A COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION METHOD USING SAME von WANG, Xiaowei, PAWLOWSKI Georg, SUZUKI Masato, OKAYASU Tetsuo

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