Generation and evolution of residual stresses in physical vapour-deposited thin films von Pauleau, Y

Volltext

Deposition and characterization of nanostructured metal/carbon composite films von Pauleau, Y., Thièry, F.

Volltext

Surface alloying of stainless steel 316 with copper using pulsed electron-beam melting of film–substrate system von Rotshtein, V.P., Ivanov, Yu.F., Markov, A.B., Proskurovsky, D.I., Karlik, K.V., Oskomov, K.V., Uglov, B.V., Kuleshov, A.K., Novitskaya, M.V., Dub, S.N., Pauleau, Y., Shulepov, I.A.

Volltext

Nanostructured copper–carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process von Pauleau, Y, Thièry, F

Volltext

Composition, mechanical properties and friction behavior of nickel/hydrogenated amorphous carbon composite films von Kukiełka, S., Gulbiński, W., Pauleau, Y., Dub, S.N., Grob, J.J.

Volltext

Mechanical properties of nanostructured copper-hydrogenated amorphous carbon composite films studied by nanoindentation von Dub, S., Pauleau, Y., Thièry, F.

Volltext

Characteristics of copper/carbon and nickel/carbon composite films produced by microwave plasma-assisted deposition techniques from argon–methane gas mixtures von Pauleau, Y., Thièry, F., Latrasse, L., Dub, S.N.

Volltext

Effect of the substrate bias voltage on the physical characteristics of copper films deposited by microwave plasma-assisted sputtering technique von Thièry, F., Pauleau, Y., Ortega, L.

Volltext

Structure and physical properties of nickel films deposited by microwave plasma-assisted cathodic sputtering von Pauleau, Y, Kukielka, S, Gulbinski, W, Ortega, L, Dub, S N

Volltext

Tribological properties of copper/carbon films formed by microwave plasma-assisted deposition techniques von Pauleau, Y., Thièry, F., Uglov, V.V., Anishchik, V.M., Kuleshov, A.K., Samtsov, M.P.

Volltext

Phase composition and tribological properties of copper/carbon composite films von Gulbiński, W., Kukiełka, S., Pauleau, Y., Thièry, F.

Volltext

Residual stresses in evaporated silicon dioxide thin films: Correlation with deposition parameters and aging behavior von Leplan, H., Geenen, B., Robic, J. Y., Pauleau, Y.

Volltext

Kinetics and reaction mechanisms of laser-assisted chemical vapor deposition of polycrystalline silicon dots from silane von Pauleau, Y., Tonneau, D.

Volltext

Electron field emission and surface morphology of a-C and a-C:H thin films von Anishchik, V.M., Uglov, V.V., Kuleshov, A.K., Filipp, A.R., Rusalsky, D.P., Astashynskaya, M.V., Samtsov, M.P., Kuznetsova, T.A., Thiery, F., Pauleau, Y.

Volltext

Kinetics of residual stress evolution in evaporated silicon dioxide films exposed to room air von Leplan, H., Robic, J. Y., Pauleau, Y.

Volltext

Structure and mechanical properties of nickel/carbon nanocomposite films formed by microwave plasma-assisted deposition technique from argon–acetylene gas mixture von Pauleau, Y., Uglov, V.V., Kuleshov, A.K., Astashynskaya, M.V., Samtsov, M.P., Dub, S.N.

Volltext

Mechanisms of intrinsic stress generation in amorphous carbon thin films prepared by magnetron sputtering von Mounier, E., Pauleau, Y.

Volltext

NICKEL/HYDROGENATED AMORPHOUS CARBON COMPOSITE FILMS DEPOSITED IN ACETYLENE/ARGON MICROWAVE PLASMA DISCHARGE von Kukielka, S, Gulbinski, W, Pauleau, Y, Dub, S N, Grob, J J

Volltext

DIELECTRIC PROPERTIES OF NICKEL CONTAINING HYDROGENATED AMORPHOUS CARBON FILMS PREPARED BY MICROWAVE PLASMA-ASSISTED DEPOSITION TECHNIQUE von Sylvestre, A, Kukielka, S, Nguyen, D M, Gulbiriski, W, Pauleau, Y

Volltext

Structural characteristics of copper/hydrogenated amorphous carbon composite films prepared by microwave plasma-assisted deposition processes from methane–argon and acetylene–argon... von Thièry, F., Pauleau, Y., Grob, J.J., Babonneau, D.

Volltext