Ripple edge engineering of graphene nanoribbons von Wagner, Philipp, Ewels, Christopher P., Ivanovskaya, Viktoria V., Briddon, Patrick R., Pateau, Amand, Humbert, Bernard

Volltext

Simulation of cryogenic silicon etching under SF 6 /O 2 /Ar plasma discharge von Haidar, Yehya, Rhallabi, Ahmed, Pateau, Amand, Mokrani, Arezki, Taher, Fadia, Roqueta, Fabrice, Boufnichel, Mohamed

Volltext

Modeling of inductively coupled plasma SF{sub 6}/O{sub 2}/Ar plasma discharge: Effect of O{sub 2} on the plasma kinetic properties von Pateau, Amand, Rhallabi, Ahmed, Fernandez, Marie-Claude, Boufnichel, Mohamed, Roqueta, Fabrice

Volltext

SF 6 and C 4 F 8 global kinetic models coupled to sheath models von Haidar, Yehya, Pateau, Amand, Rhallabi, Ahmed, Fernandez, Marie Claude, Mokrani, Arezki, Taher, Fadia, Roqueta, Fabrice, Boufnichel, Mohamed

Volltext

SF sub(6) and C sub(4)F sub(8) global kinetic models coupled to sheath models von Haidar, Yehya, Pateau, Amand, Rhallabi, Ahmed, Fernandez, Marie Claude, Mokrani, Arezki, Taher, Fadia, Roqueta, Fabrice, Boufnichel, Mohamed

Volltext

Ripple edge engineering of graphene nanoribbons von Wagner, Philipp, Ewels, Christopher P, Ivanovskaya, Viktoria V, Briddon, Patrick R, Amand Pateau, Humbert, Bernard

Volltext