Gate-Controlled Energy Barrier at a Graphene/Molecular Semiconductor Junction von Parui, Subir, Pietrobon, Luca, Ciudad, David, Vélez, Saül, Sun, Xiangnan, Casanova, Fèlix, Stoliar, Pablo, Hueso, Luis E.

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Graphene as an electrode for solution-processed electron-transporting organic transistors von Parui, Subir, Ribeiro, Mário, Atxabal, Ainhoa, Llopis, Roger, Casanova, Fèlix, Hueso, Luis E

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Energy Level Alignment at Metal/Solution‐Processed Organic Semiconductor Interfaces von Atxabal, Ainhoa, Braun, Slawomir, Arnold, Thorsten, Sun, Xiangnan, Parui, Subir, Liu, Xianjie, Gozalvez, Cristian, Llopis, Roger, Mateo‐Alonso, Aurelio, Casanova, Felix, Ortmann, Frank, Fahlman, Mats, Hueso, Luis E.

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Gate-tunable graphene-organic interface barrier for vertical transistor and logic inverter von Parui, Subir, Ribeiro, Mário, Atxabal, Ainhoa, Bairagi, Kaushik, Zuccatti, Elisabetta, Safeer, C. K., Llopis, Roger, Casanova, Fèlix, Hueso, Luis E.

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Reliable determination of the Cu/n-Si Schottky barrier height by using in-device hot-electron spectroscopy von Parui, Subir, Atxabal, Ainhoa, Ribeiro, Mário, Bedoya-Pinto, Amilcar, Sun, Xiangnan, Llopis, Roger, Casanova, Fèlix, Hueso, Luis E.

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Graphene as an electrode for solution-processed electron-transporting organic transistorsElectronic supplementary information (ESI) available. See DOI: 10.1039/c7nr01007a von Parui, Subir, Ribeiro, Mário, Atxabal, Ainhoa, Llopis, Roger, Casanova, Fèlix, Hueso, Luis E

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Strain Effects on the Energy-Level Alignment at Metal/Organic Semiconductor Interfaces von Atxabal, Ainhoa, McMillan, Stephen R, García-Arruabarrena, Beñat, Parui, Subir, Llopis, Roger, Casanova, Fèlix, Flatté, Michael E, Hueso, Luis E

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Molecular spectroscopy in a solid-state device von Atxabal, Ainhoa, Arnold, Thorsten, Parui, Subir, Zuccatti, Elisabetta, Cinchetti, Mirko, Casanova, Fèlix, Ortmann, Frank, Hueso, Luis E

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Hot electron transport in a strongly correlated transition-metal oxide von Rana, Kumari Gaurav, Yajima, Takeaki, Parui, Subir, Kemper, Alexander F., Devereaux, Thomas P., Hikita, Yasuyuki, Hwang, Harold Y., Banerjee, Tamalika

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SUBSTRATE PROCESSING APPARATUS von Houben, Kelly, Terhorst, Herbert, Pierreux, Dieter, Karagiannis, Angelos, Oosterlaken, Theodorus G.M, Parui, Subir, Knaepen, Werner

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SUBSTRATE PROCESSING APPARATUS von OOSTERLAKEN, Theodorus G.M, KARAGIANNIS, Angelos, KNAEPEN, Werner, PARUI, Subir, PIERREUX, Dieter, HOUBEN, Kelly, TERHORST, Herbert

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Robust Spin Interconnect with Isotropic Spin Dynamics in Chemical Vapour Deposited Graphene Layers and Boundaries von Khokhriakov, Dmitrii, Karpiak, Bogdan, Anamul Md Hoque, Zhao, Bing, Parui, Subir, Dash, Saroj P

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Substrate processing apparatus von PARUI, SUBIR, TERHORST, HERBERT, KNAEPEN, WERNER, HOUBEN, KELLY, KARAGIANNIS, ANGELOS, OOSTERLAKEN, THEODORUS G.M, PIERREUX, DIETER

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SUBSTRATE PROCESSING APPARATUS von KNAEPEN WERNER, TERHORST HERBERT, PARUI SUBIR, KARAGIANNIS ANGELOS, HOUBEN KELLY, PIERREUX DIETER, OOSTERLAKEN THEODORUS G.M

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Reliable determination of the Cu/n-Si Schottky barrier height by using in-device hot-electron spectroscopy von Parui, Subir, Atxabal, Ainhoa, Ribeiro, Mário, Bedoya-Pinto, Amilcar, Sun, Xiangnan, Llopis, Roger, Casanova, Fèlix, Hueso, Luis E

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Spin transport in metal and oxide devices at the nanoscale von Parui, S., Rana, K. G., Banerjee, T.

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Chemical vapor deposition furnace and method for depositing films von JONGBLOED, BERT, MARIANO, MARINA, PARUI, SUBIR, JDIRA, LUCIAN, TERHORST, HERBERT, KNAEPEN, WERNER, KLAVER, ARJEN, OOSTERLAKEN, THEODORUS G.M, PIERREUX, DIETER

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Chemical Vapor Deposition Furnace for Depositing Films von JONGBLOED BERT, KNAEPEN WERNER, TERHORST HERBERT, PARUI SUBIR, KLAVER ARJEN, JDIRA LUCIAN, PIERREUX DIETER, OOSTERLAKEN THEODORUS G.M, MARIANO MARINA

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Microstrip Line Fed Two Element E-Plane HDRA Antenna Array von Sarkar, Goffar Ali, Parui, Susanta Kumar

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