Physical and chemical analysis of advanced interconnections using energy filtering transmission electron microscopy von Pantel, R, Torres, J, Paniez, P, Auvert, G

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In-situ determination of photoresist glass transition temperature by wafer curvature measurement techniques von Schiltz, A., Paniez, P.J.

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Properties and mutual interactions of various acrylate monomers used in 193 nm resists von Paniez, P.J., Perrier, F., Panabiere, M., Mortini, B., Rosilio, C.

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Application of contact angle measurements to lithographic processes von Fadda, E., Clarisse, C., Paniez, P.J.

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Extensive thermal characterization of advanced resists by Modulated Temperature DSC (MT-DSC): Application to acrylate based 193 nm resists von Paniez, P.J., Guinot, J-A., Mortini, B., Rosilio, C.

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Bottom Anti-Reflective Coatings for DUV lithography: Determination of optimum thermal process conditions von Schiltz, A., Terpan, J-F., Amblard, G., Paniez, P.J.

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Free volume effects in chemically amplified DUV positive resists von Pain, L., Le Cornec, C., Rosilio, C., Paniez, P.J.

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Etching of polymers by oxygen plasmas : influence of viscoelastic properties von JOUBERT, O, PANIEZ, P, PELLETIER, J, PONS, M

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Bottom anti-reflective coatings: Control of thermal processing von Schiltz, A., Terpan, J-F., Brun, S., Paniez, P.J.

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Plasma etching of polymers : a reinvestigation of temperature effects von PONS, M, JOUBERT, O, PANIEZ, P, PELLETIER, J

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MICROPATTERNING FOR ADVANCED INTERCONNECTIONS von VINET, F., PANIEZ, P. J.

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Polymer behavior under plasma etching : influence of physical properties on kinetics and durability von JOUBERT, O, PANIEZ, P, PONS, M, PELLETIER, J

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Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists von Yamachika, Mikio, Patterson, Kyle, Cho, Sungseo, Rager, Timo, Yamada, Shintaro, Byers, Jeffrey, Paniez, P. J., Mortini, B., Gally, S., Sassoulas, P-O., Willson, C. Grant

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Resist degradation under plasma exposure : synergistic effects of ion bombardment von JOUBERT, O, FIORI, C, OBERLIN, J. C, PANIEZ, P, PELLETIER, J, PONS, M, VACHETTE, T, WEILL, A

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Ultraviolet induced transformation of polysiloxane films von JOUBERT, O, HOLLINGER, G, FIORI, C, DEVINE, R. A. B, PANIEZ, P, PANTEL, R

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Temperature effects in the dry etching step of a silylation process von JOUBERT, O, PONS, M, WEILL, A, PANIEZ, P

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Free volume and relaxation effects in polymer layers: application to the spin coating and bake processes von Paniez, P., Pons, M., Joubert, O.

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The role of self diffusion in the dry development and plasma durability of polymers von Paniez, P.J., Joubert, O.P., Pons, M.J., Oberlin, J.C., Vachette, T.G., Weill, A.P., Pelletier, J.H., Fiori, C.

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Melt flow of the silylated areas during the desire process von Weill, A., Joubert, O., Paniez, P., Debaene, F., Pons, M., Sage, D.

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Thermostable trilayer resist for niobium lift-off von Dubos, P., Charlat, P., Crozes, Th, Paniez, P., Pannetier, B.

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