Characterization of the ultrathin HfO2 and Hf-silicate films grown by atomic layer deposition von TZE CHIANG CHEN, PENG, Cheng-Yi, TSENG, Chih-Hung, LIAO, Ming-Han, CHEN, Mei-Hsin, WU, Chih-I, CHERN, Ming-Yau, TZENG, Pei-Jer, CHEE WEE LIU

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Sensing characteristics of dopamine using Pt/n-Si structure von Roy, Anisha, Maikap, Siddheswar, Tzeng, Pei-Jer, Qiu, Jiantai Timothy

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An Ultrathin Forming-Free HfOx Resistance Memory With Excellent Electrical Performance von CHEN, Yu-Sheng, LEE, Heng-Yuan, CHEN, Pang-Shiu, WU, Tai-Yuan, WANG, Ching-Chiun, TZENG, Pei-Jer, CHEN, Frederick, TSAI, Ming-Jinn, LIEN, Chenhsin

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Effects of Slurry in Cu Chemical Mechanical Polishing (CMP) of TSVs for 3-D IC Integration von Jui-Chin Chen, Lau, J. H., Pei-Jer Tzeng, Shang-Chun Chen, Chien-Ying Wu, Chien Chou Chen, Yu Chen Hsin, Yi-Feng Hsu, Shang Hung Shen, Sue-Chen Liao, Chi-Hon Ho, Cha-Hsin Lin, Tzu-Kun Ku, Ming-Jer Kao

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Fully Symmetric 3-D Transformers With Through-Silicon via IPD Technology for RF Applications von Li, Sih-Han, Hsu, Shawn S. H., Chen, Kuan-Wei, Lin, Chih-Sheng, Chen, Shang-Chun, Zhang, Jie, Tzeng, Pei-Jer

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Low-Power Switching of Nonvolatile Resistive Memory Using Hafnium Oxide von Lee, Heng-Yuan, Chen, Pang-Shiu, Wang, Ching-Chiun, Maikap, Siddheswar, Tzeng, Pei-Jer, Lin, Cha-Hsin, Lee, Lurng-Shehng, Tsai, Ming-Jinn

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Electrical evidence of unstable anodic interface in Ru∕HfOx∕TiN unipolar resistive memory von Lee, Heng Yuan, Chen, Pang Shiu, Wu, Tai Yuan, Wang, Ching Chiun, Tzeng, Pei Jer, Lin, Cha Hsin, Chen, Frederick, Tsai, Ming-Jinn, Lien, Chenhsin

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Nanoscale Multigate TiN Metal Nanocrystal Memory Using High-k Blocking Dielectric and High-Work-Function Gate Electrode Integrated on Silcon-on-Insulator Substrate von Lu, Chi-Pei, Luo, Cheng-Kei, Tsui, Bing-Yue, Lin, Cha-Hsin, Tzeng, Pei-Jer, Wang, Ching-Chiun, Tsai, Ming-Jinn

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Charge-Trapping-Type Flash Memory Device With Stacked High- k Charge-Trapping Layer von Ping-Hung Tsai, Kuei-Shu Chang-Liao, Te-Chiang Liu, Tien-Ko Wang, Pei-Jer Tzeng, Cha-Hsin Lin, Lee, L.S., Ming-Jinn Tsai

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Plasma charging damage on MOS devices with gate insulator of high-dielectric constant material von Pei-Jer Tzeng, Yi-Yuan Chang, Kuei-Shu Chang-Liao

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A process for high yield and high performance carbon nanotube field effect transistors von Lee, Tseng-Chin, Tsui, Bing-Yue, Tzeng, Pei-Jer, Wang, Ching-Chiun, Tsai, Ming-Jinn

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An Ultrathin Forming-Free \hbox Resistance Memory With Excellent Electrical Performance von Yu-Sheng Chen, Heng-Yuan Lee, Pang-Shiu Chen, Tai-Yuan Wu, Ching-Chiun Wang, Pei-Jer Tzeng, Chen, Frederick, Ming-Jinn Tsai, Chenhsin Lien

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Feedback control of HfO2 etch processing in inductively coupled Cl2/N2/Ar plasmas von Lin, Chaung, Leou, Keh-Chyang, Li, Ting-Chieh, Lee, Lurng-Shehng, Tzeng, Pei-Jer

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A novel SONOS-type flash device with stacked charge trapping layer von Ye, Zong-Hao, Chang-Liao, Kuei-Shu, Liu, Te-Chiang, Wang, Tien-Ko, Tzeng, Pei-Jer, Lin, Cha-Hsin, Tsai, Min-Jinn

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Plasma-charging effects on submicron MOS devices von Pei-Jer Tzeng, Chang, Y.-Y.I., Chun-Chen Yeh, Chih-Chiang Chen, Chien-Hung Liu, Mu-Yi Liu, Bone-Fong Wu, Kuei-Shu Chang-Liao

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Novel SONOS – type nonvolatile memory device with stacked tunneling and charge trapping layers von Tsai, Ping-Hung, Chang-Liao, Kuei-Shu, Wu, Tai-Yu, Wang, Tien-Ko, Tzeng, Pei-Jer, Lin, Cha-Hsin, Lee, Lung-Sheng, Tsai, Ming-Jin

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Oxide Liner, Barrier and Seed Layers, and Cu Plating of Blind Through Silicon Vias (TSVs) on 300 mm Wafers for 3D IC Integration von WU, Chien-Ying, CHEN, Shang-Chun, KU, Tzu-Kun, KAO, Ming-Jer, TZENG, Pei-Jer, LAU, John H, HSU, Yi-Feng, CHEN, Jui-Chin, HSIN, Yu-Chen, CHEN, Chien-Chou, SHEN, Shang-Hung, LIN, Cha-Hsin

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Study on the interface thermal stability of metal-oxide-semiconductor structures by inelastic electron tunneling spectroscopy von Huang, Chih-Feng, Tsui, Bing-Yue, Tzeng, Pei-Jer, Lee, Lurng-Shehng, Tsai, Ming-Jinn

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Effects of etch rate on scallop of through-silicon vias (TSVs) in 200mm and 300mm wafers von Yu-Chen Hsin, Chien-Chou Chen, Lau, J. H., Pei-Jer Tzeng, Shang-Hung Shen, Yi-Feng Hsu, Shang-Chun Chen, Chien-Ying Wn, Jui-Chin Chen, Tzu-Kun Ku, Ming-Jer Kao

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Reduction of Plasma Etching Induced Electrical Degradation in Metal-Oxide-Si Capacitors by Furnace Grown Oxides Rapid Thermal Annealed in N 2 O von Kuei-Shu Chang-Liao, Kuei-Shu Chang-Liao, Pei-Jer Tzeng, Pei-Jer Tzeng

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