ATOMIC LAYER DEPOSITION APPARATUS AND METHOD OF FABRICATING ATOMIC LAYER USING THE SAME von PARK JONG-RYUK, YANG TAE-HOON, JEONG MIN-JAE, KANG EU-GENE, KIM YOUNG-DAE, CHANG SEOK-RAK, JUNG JAE-WAN, LEE KL-YONG, SEO JIN-WOOK, AHN JI-SU, HONG JONG-WON, PARK BYPUNG-KEON, LEE DONG-HYUN, NA HEUNG-YEOL, YUN SANG-HYUN, LEE KIL-WON, CHUNG YUN-MO, CHOI BO-KYUNG

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