Properties and mutual interactions of various acrylate monomers used in 193 nm resists von Paniez, P.J., Perrier, F., Panabiere, M., Mortini, B., Rosilio, C.

Volltext

In-situ determination of photoresist glass transition temperature by wafer curvature measurement techniques von Schiltz, A., Paniez, P.J.

Volltext

Application of contact angle measurements to lithographic processes von Fadda, E., Clarisse, C., Paniez, P.J.

Volltext

Extensive thermal characterization of advanced resists by Modulated Temperature DSC (MT-DSC): Application to acrylate based 193 nm resists von Paniez, P.J., Guinot, J-A., Mortini, B., Rosilio, C.

Volltext

Bottom Anti-Reflective Coatings for DUV lithography: Determination of optimum thermal process conditions von Schiltz, A., Terpan, J-F., Amblard, G., Paniez, P.J.

Volltext

MICROPATTERNING FOR ADVANCED INTERCONNECTIONS von VINET, F., PANIEZ, P. J.

Volltext

Free volume effects in chemically amplified DUV positive resists von Pain, L., Le Cornec, C., Rosilio, C., Paniez, P.J.

Volltext

Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists von Yamachika, Mikio, Patterson, Kyle, Cho, Sungseo, Rager, Timo, Yamada, Shintaro, Byers, Jeffrey, Paniez, P. J., Mortini, B., Gally, S., Sassoulas, P-O., Willson, C. Grant

Volltext

Bottom anti-reflective coatings: Control of thermal processing von Schiltz, A., Terpan, J-F., Brun, S., Paniez, P.J.

Volltext

The role of self diffusion in the dry development and plasma durability of polymers von Paniez, P.J., Joubert, O.P., Pons, M.J., Oberlin, J.C., Vachette, T.G., Weill, A.P., Pelletier, J.H., Fiori, C.

Volltext

Silylation of three component E-beam resists: application to shipley SAL 601 von Vachette, Thierry G., Paniez, Patrick J., Madore, Michel

Volltext

Acidity of lithographic materials: Characterization by colorimetric titration von Paniez, P.J., Demattei, D.C., Abadie, M.J.M.

Volltext

Proximity E-beam exposure in submicron patterns using a silylation process von Vachette, Thierry G., Paniez, Patrick J., Lalanne, Frederic, Madore, Michel

Volltext

200 mm DUV Lithography : Material and Process Optimization Application to 0.25 μm CMOS Technology von Vinet, F., Buffet, N., Le Cornec, Ch, Lerme, M., Morand, Y., Mourier, T., Previtali, B, Paniez, P. J.

Volltext bestellen

True cosmic microwave background power spectrum estimation von Paykari, P., Starck, J.-L., Fadili, M. J.

Volltext

Physical and chemical analysis of advanced interconnections using energy filtering transmission electron microscopy von Pantel, R, Torres, J, Paniez, P, Auvert, G

Volltext

Thermal conversion of ppv precursor: characterization at different stages of the process von Wéry, Jany, Dulieu, Bertrand, Baïtoul, Mimouna, Paniez, Patrick, Froyer, Gérard, Lefrant, Serge

Volltext

Development of Polymers in O 2 Plasmas: Temperature Effects and Transition to Imperfect Anisotropy von Pons, Michel, Pelletier, Jacques, Joubert, Olivier, Patrick Paniez, Patrick Paniez

Volltext

Etching of polymers by oxygen plasmas : influence of viscoelastic properties von JOUBERT, O, PANIEZ, P, PELLETIER, J, PONS, M

Volltext

Plasma etching of polymers : a reinvestigation of temperature effects von PONS, M, JOUBERT, O, PANIEZ, P, PELLETIER, J

Volltext