Globally and symmetrically identified Bayesian multinomial probit model von Pan, Maolin, Gu, Minggao, Wu, Xianyi, Fan, Xiaodan

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O2 Plasma Alternately Treated ALD-Al2O3 as Gate Dielectric for High Performance AlGaN/GaN MIS-HEMTs von Wang, Qiang, Pan, Maolin, Zhang, Penghao, Wang, Luyu, Yang, Yannan, Xie, Xinling, Huang, Hai, Hu, Xin, Xu, Min

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Improved Vth Stability and Gate Reliability of GaN-Based MIS-HEMTs by Employing Alternating O2 Plasma Treatment von Xie, Xinling, Wang, Qiang, Pan, Maolin, Zhang, Penghao, Wang, Luyu, Yang, Yannan, Huang, Hai, Hu, Xin, Xu, Min

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Detecting Data Flow Errors Across Processes in Business Process Collaboration von Xiong, Tianhong, Pan, Maolin, Yu, Yang, Lou, Dingjun

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High Selectivity, Low Damage ICP Etching of p -GaN over AlGaN for Normally-off p -GaN HEMTs Application von Zhang, Penghao, Wang, Luyu, Zhu, Kaiyue, Yang, Yannan, Fan, Rong, Pan, Maolin, Xu, Saisheng, Xu, Min, Wang, Chen, Wu, Chunlei, Zhang, David Wei

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In Situ H-Radical Surface Treatment on Aluminum Gallium Nitride for High-Performance Aluminum Gallium Nitride/Gallium Nitride MIS-HEMTs Fabrication von Yang, Yannan, Fan, Rong, Zhang, Penghao, Wang, Luyu, Pan, Maolin, Wang, Qiang, Xie, Xinling, Xu, Saisheng, Wang, Chen, Wu, Chunlei, Xu, Min, Jin, Jian, Zhang, David Wei

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Non-Buffer Epi-AlGaN/GaN on SiC for High-Performance Depletion-Mode MIS-HEMTs Fabrication von Zhang, Penghao, Wang, Luyu, Zhu, Kaiyue, Wang, Qiang, Pan, Maolin, Huang, Ziqiang, Yang, Yannan, Xie, Xinling, Huang, Hai, Hu, Xin, Xu, Saisheng, Xu, Min, Wang, Chen, Wu, Chunlei, Zhang, David Wei

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A Novel Atomic-Level Post-Etch-Surface-Reinforcement Process for High-Performance p-GaN Gate HEMTs Fabrication von Wang, Luyu, Zhang, Penghao, Zhu, Kaiyue, Wang, Qiang, Pan, Maolin, Sun, Xin, Huang, Ziqiang, Chen, Kun, Yang, Yannan, Xie, Xinling, Huang, Hai, Hu, Xin, Xu, Saisheng, Wu, Chunlei, Wang, Chen, Xu, Min, Zhang, David Wei

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Spectral Methods in Spatial Statistics von Chen, Kun, Zhang, Lianmin, Pan, Maolin

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Smart contract generation for inter‐organizational process collaboration von Xiong, Tianhong, Feng, Shangqing, Pan, Maolin, Yu, Yang

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Crystal cleavage, periodic nanostructure and surface modification of SiC ablated by femtosecond laser in different media von Wu, Chen, Fang, Xudong, Kang, Qiang, Sun, Hao, Zhao, Libo, Tian, Bian, Fang, Ziyan, Pan, Maolin, Maeda, Ryutaro, Jiang, Zhuangde

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QRS Detection Based on Improved Adaptive Threshold von Lu, Xuanyu, Yu, Yang, Pan, Maolin

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Novel enhancement-mode p-channel GaN MOSFETs with an AlN insert layer von Huang, Hai, Pan, Maolin, Wang, Qiang, Xie, Xinling, Yang, Yannan, Hu, Xin, Wang, Luyu, Zhang, Penghao, Xu, Min, Zhang, David Wei

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GaN monolithic digital units on P-GaN platform von Pan, Maolin, Huang, Hai, Zhao, YiFei, Hu, Xin, Yang, Yannan, Qian, Lewen, Wang, Qiang, Zhang, Penghao, Xu, Saisheng, Xu, Min

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Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology von Qian, Lewen, Sun, Xin, Liu, Tao, Huang, Ziqiang, Guo, Xinlong, Pan, Maolin, Wang, Dawei, Xu, Saisheng, Xu, Min, Wang, Chen, Wu, Chunlei, Zhang, David Wei

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NH3/N2 plasma treatment on etched AlGaN surface for high-performance p-GaN HEMTs fabrication von Pan, Maolin, Wang, Qiang, Wang, Luyu, Zhang, Penghao, Yang, Yannan, Qian, Lewen, Xie, Xinlin, Huang, Hai, Xu, Saisheng, Wu, Chunlei, Wang, Chen, Xu, Min, Zhang, David Wei

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A Low-Code Framework for Complex Crowdsourcing Work Based on Process Modeling von Xiong, Tianhong, Pan, Maolin, Yu, Yang, Lou, Dingjun

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O 2 Plasma Alternately Treated ALD-Al 2 O 3 as Gate Dielectric for High Performance AlGaN/GaN MIS-HEMTs von Wang, Qiang, Pan, Maolin, Zhang, Penghao, Wang, Luyu, Yang, Yannan, Xie, Xinling, Huang, Hai, Hu, Xin, Xu, Min

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Nondestructive differential eddy current testing for corrosion detection on coated aluminium alloys von Tang, Xiaoliang, Zhou, Jun, Jian, Guangjian, Deng, Qingzhu, Zhao, Wen, Mo, Shaolan, She, Zuxin, Zhong, Yong, Huang, Lun, Shu, Chang, Pan, Maolin, Wang, Zhongwei

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Improved V th Stability and Gate Reliability of GaN-Based MIS-HEMTs by Employing Alternating O 2 Plasma Treatment von Xie, Xinling, Wang, Qiang, Pan, Maolin, Zhang, Penghao, Wang, Luyu, Yang, Yannan, Huang, Hai, Hu, Xin, Xu, Min

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