Magnetic spectroscopy of nanoparticulate greigite, Fe3S4 von Pattrick, Richard A. D, Coker, Victoria S, Akhtar, Masood, Malik, M. Azad, Lewis, Edward, Haigh, Sarah, O'Brien, Paul, Shafer, Padraic C, van der Laan, Gerrit

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Magnetic spectroscopy of nanoparticulate greigite, Fe 3 S 4 von Pattrick, Richard A. D., Coker, Victoria S., Akhtar, Masood, Malik, M. Azad, Lewis, Edward, Haigh, Sarah, O'Brien, Paul, Shafer, Padraic C., van der Laan, Gerrit

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Magnetic spectroscopy of nanoparticulate greigite, Fe3S4 von Pattrick, Richard, Coker, Victoria, Akhtar, Masood, Malik, Mohammad, Lewis, Edward, Haigh, Sarah, O'Brien, Paul, Shafer, Padraic C, van der Laan, Gerrit

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FET STRUCTURE USING DISPOSABLE SPACER AND STRESS INDUCING LAYER von MANN RANDY WILLIAM, WENHE LIN, BAIOCCO CHRISTOPHER VINCENT, YANG HAINING S, SHAFER PADRAIC C, ZHIJOING LUO, XIANGDONG CHEN

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FET STRUCTURE USING DISPOSABLE SPACER AND STRESS INDUCING LAYER von MANN RANDY WILLIAM, BAIOCCO CHRISTOPHER VINCENT, CHEN XIANGDONG, YANG HAINING S, LIN WENHE, SHAFER PADRAIC C, LUO ZHIJOING

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FET STRUCTURE USING DISPOSABLE SPACER AND STRESS INDUCING LAYER von MANN RANDY WILLIAM, WENHE LIN, BAIOCCO CHRISTOPHER VINCENT, YANG HAINING S, SHAFER PADRAIC C, ZHIJOING LUO, XIANGDONG CHEN

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Filling high aspect ratio isolation structures with polysilazane based material von ECONOMIKOS LAERTIS, SETTLEMYER KENNETH T.JR, DIVAKARUNI RAMA, JAMMY RAJARAO, SHAFER PADRAIC C, BELYANSKY MICHAEL P

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Filling high aspect ratio isolation structures with polysilazane based material von Belyansky, Michael P, Divakaruni, Rama, Economikos, Laertis, Jammy, Rajarao, Settlemeyer, Jr, Kenneth T, Shafer, Padraic C

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Filling high aspect ratio isolation structures with polysilazane based material von ECONOMIKOS LAERTIS, DIVAKARUNI RAMA, JAMMY RAJARAO, SHAFER PADRAIC C, BELYANSKY MICHAEL P, SETTLEMYER KENNETH T

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FILLING HIGH ASPECT RATIO ISOLATION STRUCTURES WITH POLYSILAZANE BASED MATERIAL von ECONOMIKOS LAERTIS, DIVAKARUNI RAMA, JAMMY RAJARAO, SHAFER PADRAIC C, BELYANSKY MICHAEL P, SETTLEMYER KENNETH T

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CARBON-GRADED LAYER FOR IMPROVED ADHESION OF LOW-K DIELECTRICS TO SILICON SUBSTRATES von KIA-SENG LOW, PETER WRSCHKA, PRAKASH C. DEV, DANIEL C. EDELSTEIN, RICHARD A. CONTI, DAVID M. DOBUZINSKY, ALEXANDER SIMPSON, GILL Y. LEE, PADRAIC C. SHAFER

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Filling high aspect ratio isolation structures with polysilazane based material von ECONOMIKOS LAERTIS, DIVAKARUNI RAMA, JAMMY RAJARAO, SETTLEMEYER, JR. KENNETH T, SHAFER PADRAIC C, BELYANSKY MICHAEL P

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METHOD FOR FILLING UP SEPARATION STRUCTURE HAVING HIGH ASPECT RATIO WITH MATERIAL BASED ON POLYSILAZANE von ECONOMIKOS LAERTIS, DIVAKARUNI RAMA, JAMMY RAJARAO, SHAFER PADRAIC C, BELYANSKY MICHAEL P, SETTLEMYER JR KENNETH T

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METHOD AND STRUCTURE FOR SALICIDE TRENCH CAPACITOR PLATE ELECTRODE von CHUDZIK MICHAEL PATRICK, JAMMY RAJARAO, SHEPARD JOSEPH F, RADENS CARL JOHN, MANDELMAN JACK ALLAN, SHAFER PADRAIC C, SETTLEMYER KENNETH T

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Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates von DOBUZINSKY DAVID M, WRSCHKA PETER, LOW KIA-SENG, LEE GILL Y, SIMPSON ALEXANDER, DEV PRAKASH CHIMANLAL, SHAFER PADRAIC C, EDELSTEIN DANIEL C, CONTI RICHARD A

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Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates von Conti, Richard A, Dev, Prakash Chimanlal, Dobuzinsky, David M, Edelstein, Daniel C, Lee, Gill Y, Low, Kia-Seng, Shafer, Padraic C, Simpson, Alexander, Wrschka, Peter

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Method and structure for salicide trench capacitor plate electrode von CHUDZIK MICHAEL PATRICK, SETTLEMYER, JR. KENNETH T, JAMMY RAJARAO, RADENS CARL JOHN, MANDELMAN JACK ALLAN, SHAFER PADRAIC C, SHEPARD, JR. JOSEPH F

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Method and structure for salicide trench capacitor plate electrode von Chudzik, Michael Patrick, Mandelman, Jack Allan, Radens, Carl John, Jammy, Rajarao, Settlemyer, Jr., Kenneth T, Shafer, Padraic C, Shepard, Jr., Joseph F

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Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates von DOBUZINSKY DAVID M, WRSCHKA PETER, LOW KIA-SENG, LEE GILL Y, SIMPSON ALEXANDER, DEV PRAKASH CHIMANLAL, SHAFER PADRAIC C, EDELSTEIN DANIEL C, CONTI RICHARD A

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Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates von Conti, Richard A, Dev, Prakash Chimanlal, Dobuzinsky, David M, Edelstein, Daniel C, Lee, Gill Y, Low, Kia-Seng, Shafer, Padraic C, Simpson, Alexander, Wrschka, Peter

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