Progress in Spin-on Hard Mask Materials for Advanced Lithography von Padmanaban, Munirathna, Cho, JoonYeon, Kudo, Takanori, Rahman, Dalil, Yao, Huirong, McKenzie, Douglas, Dioses, Alberto, Mullen, Salem, Wolfer, Elizabeth, Yamamoto, Kazuma, Cao, Yi, Her, YoungJun

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Spin-on Metal Oxides and Their Applications for Next Generation Lithography von Yao, Huirong, Mullen, Salem, Wolfer, Elizabeth, Mckenzie, Douglas, Dioses, Alberto, Rahman, Dalil, Cho, JoonYeon, Padmanaban, Munirathna, Petermann, Claire, Hong, SungEun, Mannaert, Geert, Hopf, Toby, Simone, Danilo De, Vangoidsenhoven, Diziana, Lorant, Christophe, Sebaai, Farid, Sanchez, Efrain Altamirano

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Functional Properties of Novel Metallic Hard Masks von Padmanaban, Murirathna, Cho, Joon Yeon, Yao, Huirong, McKenzie, Douglas, Dioses, Alberto, Mullen, Salem, Wolfer, Elizabeth, Kurosawa, Kazunori

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Designing an ordered template of cylindrical arrays based on a simple flat plate confinement of block copolymers: a coarse-grained molecular dynamics study von Pinge, Shubham, Lin, Guanyang, Baskaran, Durairaj, Padmanaban, Munirathna, Joo, Yong Lak

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PAG and Quencher Effects on DBARC Performance von Padmanaban, Murirathna, Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Neisser, Mark, Miyazaki, Shinji, Miyamoto, Kazma, Akiyama, Yasushi, Ishizu, Yuko

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Responding to the Challenge: Materials Design for Immersion Lithography von Padmanaban, Munirathna, Romano, Andrew, Lin, Guanyang, Chiu, Simon, Timko, Allen, Houlihan, Frank, Rahman, Dalil, Dammel, Ralph R., Turnquest, Karen, Rich, Georgia, Shuetter, Scott D., Shedd, Timonthy A., Nellis, Gregory A.

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Possible Origins and Some Methods to Minimize LER von Padmanaban, Murirathna, Rentkiewicz, David, Hong, Chisun, Lee, Dongkwa, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph R.

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Contact Hole Resist Solutions for 45-90nm Node Design Rules von Padmanaban, Murirathna, Kudo, Takamori, Lin, Guanyang, Hong, Sungeun, Nishibe, Takeshi, Takano, Yusuke

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Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity von Padmanaban, Munirathna, Anyadiegwu, Clement, Kanda, Takashi, Kim, Woo-Kyu, Kudo, Takanori, McKenzie, Douglas, Rahman, Dalil, Dammel, Ralph, Lee, SangHo

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Etch Properties of 193nm Resists: Issues and Approaches von Padmanaban, Munirathna, Alemy, Eric, Dammel, Ralph, Kim, Woo-Kyu, Kudo, Takanori, Lee, SangHo, Rahman, Dalil, Chen, Wan-Lin, Sadjadi, Reza M., Livesay, William, Ross, Matthew

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Materials and Resists for 193 and 157nm Applications von Padmanaban, Munirathna, Alemy, Eric, Bae, Jun-Bom, Kim, Woo-Kyu, Kudo, Takanori, Masuda, Seiya, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo

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Progress in EUV Underlayer Materials von Yao, Huirong, Mullen, Salem, Bogusz, Zachary, Cho, Joon Yeon, Padmanaban, Murirathna

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Layer-Specific Resists for 193nm Lithography von Padmanaban, Munirathna, Bae, Jun-Bom, Kim, Woo-Kyu, Kudo, Takanori, Rahman, M. Dalil, Dammel, Ralph R.

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Optimization of 193 nm Contact Hole Resists for 100 nm Node von Kudo, Takanori, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Lee, Sang-Ho, Masuda, Seiya, McKenzie, Douglas, Rahman, M. Dalil, Romano, Andrew, Padmanaban, Munirathna, Chun, Jun-Sung, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo, Kim, Hyeong-Soo

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Mechanistic Studies on the CD Degradation of 193nm Resists during SEM Inspection von Kudo, Takanori, Dammel, Ralph R., Bae, Jun-Born, Rahman, M. Dalil, Kim, Woo-Kyu, McKenzie, Douglas, Alemy, Eric L., Ng, Waiman, Padmanaban, Munirathna

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Sensitized Transparent Photobase Additive For 193 nm Lithography von Padmanaban, Munirathna, Bae, Jun-Born, Cook, Michelle, Kim, Woo-Kyu, Klauck-Jacobs, Axel, Kudo, Takanori, Rahman, M. Dalil, Dammel, Ralph R, Byers, Jeffrey D.

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Advances and Challenges in Developable Bottom Anti-Reflective Coating (DBARC) von Kudo, Takanori, Chakrapani, Srinivasan, Dioses, Alberto, Ng, Edward, Antonio, Charito, Parthasarathy, Deepa, Miyazaki, Shinji, Yamamoto, Kazuma, Akiyama, Yasushi, Collett, Richard, Neisser, Mark, Padmanaban, Murirathna

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Bottom Anti-Reflective Coatings for DUV Lithography von Kang, Wen-Bing, Tanaka, Hatsuyuki, Kimura, Ken, Padmanaban, Munirathna, Funato, Satoru, Kinoshita, Yoshiaki, Kudo, Takanori, Nozaki, Yuko, Pawlowski, Georg

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AROMATIC AMINO SILOXANE FUNCTIONALIZED MATERIALS FOR USE IN CAPPING POROUS DIELECTRICS von POLISHCHUK, Orest, BASKARAN, Durairaj, PADMANABAN, Munirathna, BOBADE, Sachin

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A Novel Resist Freeze Process for Double Imaging von Abdallah, David J., Alemy, Eric, Chakrapani, Srinivasan, Padmanaban, Murirathna, Dammel, Ralph R.

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