Phonon dispersion of bulk Ge-rich SiGe: inelastic X-ray scattering studies von Usuda, Koji, Oyanagi, Yuya, Yokogawa, Ryo, Uchiyama, Hiroshi, Tsutsui, Satoshi, Yonenaga, Ichiro, Ogura, Atsushi

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Suppression of Sulfur Desorption of High-Temperature Sputtered MoS 2 Film by Applying DC Bias von Hibino, Yusuke, Ishihara, Seiya, Oyanagi, Yuya, Sawamoto, Naomi, Ohashi, Takumi, Matsuura, Kentarou, Wakabayashi, Hitoshi, Ogura, Atsushi

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Suppression of Sulfur Desorption of High-Temperature Sputtered MoS2 Film by Applying DC Bias von Hibino, Yusuke, Ishihara, Seiya, Oyanagi, Yuya, Sawamoto, Naomi, Ohashi, Takumi, Matsuura, Kentarou, Wakabayashi, Hitoshi, Ogura, Atsushi

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Carrier Concentration Evaluation of MoS2 Using Oil-immersion Raman Spectroscopy von Oyanagi, Yuya, Hibino, Yusuke, Yokogawa, Ryo, Wakabayashi, Hitoshi, Ogura, Atushi

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Phonon Dispersion Measurements for Bulk Si1-xGex (x=0.72) Crystal by Inelastic X-ray Scattering von Yokogawa, Ryo, Oyanagi, Yuya, Uchiyama, Hiroshi, TsuTsui, Satoshi, Yonenaga, Ichiro, Ogura, Atsushi

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The Band Structure Evaluation of MoS2(1-x)Te2x von Hibino, Yusuke, Yamazaki, Kota, Hashimoto, Yusuke, Oyanagi, Yuya, Sawamoto, Naomi, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atsushi

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Combinatorial film deposition of Mo1-xWxS by co-sputtering with applying DC bias von Hashimoto, Yusuke, Ishihara, Seiya, Hibino, Yusuke, Oyanagi, Yuya, Yamazaki, Kota, Ogura, Atsushi, Wakabayashi, Hitoshi

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The Structural Difference of MoS2(1-x)Te2x Fabricated by Co-Sputtering for Different Deposition Conditions von Hibino, Yusuke, Hashimoto, Yusuke, Yamazaki, Kota, Oyanagi, Yuya, Sawamoto, Naomi, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atsushi

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Raman Spectroscopic Evaluation of MoS2 Film Fabricated by DC Bias Sputtering von Oyanagi, Yuya, Ishihara, Seiya, Hibino, Yusuke, Sawamoto, Naomi, Ohashi, Takumi, Matsuura, Kentarou, Wakabayashi, Hitoshi, Ogura, Atsushi

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Optimization of Fabrication Conditions of MoS2(1-x)Te2x by co-Sputtering and Tellurization von Hibino, Yusuke, Ishihara, Seiya, Yamazaki, Kota, Oyanagi, Yuya, Hashimoto, Yusuke, Sawamoto, Naomi, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atsushi

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Evaluation of film quality by various deposition condition of MOCVD MoS2 film using i-Pr2DADMo(CO)3 as Mo precursor von Yamazaki, Kota, Hibino, Yusuke, Ishihara, Seiya, Oyanagi, Yuya, Hashimoto, Yusuke, Sawamoto, Naomi, Machida, Hideaki, Ishikawa, Manato, Sudo, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atushi

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Evaluation of Physical Structure of MoS2(1-x)Te2x Fabricated via co-Sputtering and Sulfurization von Hibino, Yusuke, Ishihara, Seiya, Oyanagi, Yuya, Sawamoto, Naomi, Matsuura, Kentarou, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atsushi

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MoS2(1-x) Te2x Deposition by co-Sputtering and Post-Deposition Sulfurization using (t-C4H9)2S2 von Hibino, Yusuke, Ishihara, Seiya, Oyanagi, Yuya, Sawamoto, Naomi, Ohashi, Takumi, Matsuura, Kentarou, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atsushi

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Investigation on the Stability of MoS 2(1-x) Te 2x Fabricated By Tellurization Using Organic Precursor (i-C 3 H 7 ) 2 te von Hibino, Yusuke, Ishihara, Seiya, Yamazaki, Kota, Oyanagi, Yuya, Hashimoto, Yusuke, Sawamoto, Naomi, Machida, Hideaki, Ishikawa, Masato, Sudoh, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atsushi

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液浸ラマン分光法を用いたMoS2のキャリア濃度評価 von 小柳, 有矢, 日比野, 祐介, 横川, 凌, 若林, 整, 小椋, 厚志

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Deposition of ZrS2 by MOCVD using Zr[N(C2H5)CH3]4 and [(t-C4H9)2S2] as precursors von Yamazaki, Kota, Hibino, Yusuke, Oyanagi, Yuya, Hashimoto, Yusuke, Sawamoto, Naomi, Machida, Hideaki, Ishikawa, Masato, Sudo, Hiroshi, Wakabayashi, Hitoshi, Ogura, Atushi

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X線非弾性散乱法によるBulk Si1-xGex(x=0.72)単結晶のフォノン分散測定 von 横川, 凌, 小柳, 有矢, 内山, 裕士, 筒井, 智嗣, 米永, 一郎, 小椋, 厚志

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Zr[N(C2H5)CH3]4と[(t-C4H9)2S2]を用いたMOCVDによるZrS2の成膜 von 山崎, 浩多, 日比野, 祐介, 小柳, 有矢, 橋本, 侑祐, 澤本, 直美, 町田, 英明, 石川, 真人, 須藤, 弘, 若林, 整, 小椋, 厚志

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MoS2(1-x)Te2x混晶のバンド構造の評価 von 日比野, 祐介, 山崎, 浩多, 橋本, 侑祐, 小柳, 有矢, 澤本, 直美, 町田, 英明, 石川, 真人, 須藤, 弘, 若林, 整, 小椋, 厚志

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Coスパッタ条件によるMoS2(1-x)Te2x混晶の構造変化 von 日比野, 祐介, 橋本, 侑祐, 山崎, 浩多, 小柳, 有矢, 澤本, 直美, 町田, 英明, 石川, 真人, 須藤, 弘, 若林, 整, 小椋, 厚志

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