Unipolar and bipolar mode of deep oscillation magnetron sputtering von Oskirko, V O, Zakharov, A N, Pavlov, A P, Grenadyorov, A S, Semenov, V A

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Ion current density on the substrate during short-pulse HiPIMS von Oskirko, V O, Kozhevnikov, V Y, Rabotkin, S V, Pavlov, A P, Semenov, V A, Solovyev, A A

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Dual mode of deep oscillation magnetron sputtering von Oskirko, V.O., Zakharov, A.N., Pavlov, A.P., Solovyev, A.A., Grenadyorov, A.S., Semenov, V.A.

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Magnetron-Sputtered YSZ and CGO Electrolytes for SOFC von Solovyev, A. A., Shipilova, A. V., Ionov, I. V., Kovalchuk, A. N., Rabotkin, S. V., Oskirko, V. O.

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Power supply output inductance effect on arc parameters of high-power impulse magnetron sputtering von Oskirko, V O, Pavlov, A P, Zakharov, A Z, Semenov, V A, Azhgikhin, M I, Solovyev, A A

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The Energy Flux to the Substrate in the High-Power Impulse Magnetron Sputtering of Copper Films von Oskirko, V. O., Zakharov, A. N., Grenadyorov, A. S., Semenov, V. A., Solovyev, A. A.

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Hydrogen-Free Active Screen Plasma Nitriding of AISI 316 L Stainless Steel von Grenadyorov, A. S., Oskirko, V. O., Zakharov, A. N., Goncharenko, I. M., Semenov, V. A., Rabotkin, S. V., Solovyev, A. A.

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Comparative Study of Cu Films Prepared by DC, High-Power Pulsed and Burst Magnetron Sputtering von Solovyev, A. A., Oskirko, V. O., Semenov, V. A., Oskomov, K. V., Rabotkin, S. V.

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Power supply for mid-frequency magnetron sputtering with a wide-range control of pulses parameters von Oskirko, V O, Zakharov, A Z, Solovyev, A A, Pavlov, A P, Rabotkin, S V

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Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating von Grenadyorov, A. S., Zakharov, A. N., Oskirko, V. O., Sidelev, D. V., Oskomov, K. V., Solovyev, A. A.

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Oxidation Resistance of TiAlN Coatings Deposited by Dual High-Power Impulse Magnetron Sputtering von Grenadyorov, A. S., Oskirko, V. O., Zakharov, A. N., Oskomov, K. V., Semenov, V. A., Solovyev, A. A., Shmakov, A. N.

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Investigation of parameters of plasma generated by high-power impulse magnetron sputtering (HiPIMS) of graphite von Grenadyorov, A S, Oskirko, V O, Oskomov, K V, Semenov, V A

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Influence of nitrogen pressure and electrical parameters of a glow discharge on the process of ion plasma nitriding of steel von Oskirko, V O, Goncharenko, I M, Pavlov, A P, Zakharov, A N, Semenov, V A

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Process stabilization during reactive high power impulse magnetron sputtering of Ce/Gd target von Rabotkin, S V, Oskirko, V O, Ionov, I V, Semenov, V A, Shipilova, A V, Solovyev, A A

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CuO films deposited by superimposed high power impulse and DC magnetron sputtering von Semenov, V A, Grenadyorov, A S, Oskirko, V O, Zakharov, A N, Rabotkin, S V, Ionov, I V, Solovyev, A A

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Comparison of plasma parameters and optical emission in DC, HIPIMS and hybrid DC+HIPIMS modes of magnetron sputtering von Semenov, V A, Grenadyorov, A S, Oskirko, V O, Zakharov, A N, Rabotkin, S V, Ionov, I V, Solovyev, A A

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Properties of Molybdenum Films Produced by High-Power Impulse Magnetron Sputtering von Zakharov, A. N., Solov’ev, A. A., Oskomov, K. V., Oskirko, V. O., Semenov, V. A., Syrtanov, M. S., Bordulev, Yu. S.

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Natural Oxidation of Ultra-Thin Copper Films von Semenov, V. A., Oskirko, V. O., Rabotkin, S. V., Oskomov, K. V., Solovyev, A. A., Stepanov, S. A.

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Properties of Nanocomposite Nickel-Carbon Films Deposited by Magnetron Sputtering von Grenadyorov, A. S., Oskomov, K. V., Solov’ev, A. A., Rabotkin, S. V., Zakharov, A. N., Semenov, V. A., Oskirko, V. O., Yelgin, Yu. I., Korneva, O. S.

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Thermal stability of anti-reflective and protective a-C:H:SiOx coating for infrared optics von Grenadyorov, A.S., Solovyev, A.A., Oskomov, K.V., Oskirko, V.O., Semenov, V.A.

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