All-graphene field-effect transistor based on lateral tunnelling von Svintsov, D, Vyurkov, V, Orlikovsky, A, Ryzhii, V, Otsuji, T

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Quantum simulation of an ultrathin body field-effect transistor with channel imperfections von Vyurkov, V., Semenikhin, I., Filippov, S., Orlikovsky, A.

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State-of-the-art plasmonic crystals for molecules fluorescence detection von Baburin, Aleksandr S., Gritchenko, Anton S., Orlikovsky, Nikolay A., Dobronosova, Alina A., Rodionov, Ilya A., Balykin, Victor I., Melentiev, Pavel N.

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Optical Coupling between Resonant Dielectric Nanoparticles and Dielectric Nanowires Probed by Third Harmonic Generation Microscopy von Okhlopkov, Kirill I, Shafirin, Pavel A, Ezhov, Alexander A, Orlikovsky, Nikolay A, Shcherbakov, Maxim R, Fedyanin, Andrey A

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Optical coupling between resonant dielectric nanoparticles and dielectric waveguides probed by third harmonic generation microscopy von Okhlopkov, K I, Ezhov, A A, Shafirin, P A, Shorokhov, A S, Orlikovsky, N A, Shcherbakov, M R, Fedyanin, A A

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Wood's anomaly for plasmonic biosensor based on 1D magnetooptical nanostructure von Shaimanov, A N, Orlikovsky, N A, Khabushev, E M, Zverev, A V, Pishimova, A A, Sharonov, G V, Yankovskii, G M, Rodionov, I A, Baryshev, A V

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Boron Profile Sharpening in Ultra-Shallow p+-n Junction Produced by Plasma Immersion Ion Implantation from BF3 Plasma von Lukichev, V, Rudenko, K, Orlikovsky, A, Pustovit, A, Vyatkin, A

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Interfering surface and localized plasmon: Tuning the Wood anomaly for biosensing von Shaimanov, A.N., Orlikovsky, N.A., Khabushev, E.M., Zverev, A.V., Pishimova, A.A., Sharonov, G.V., Yankovskii, G.M., Rodionov, I.A., Baryshev, A.V.

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On the Parameters of Inductively Coupled and Microwave BF3 Plasmas Used for Plasma Immersion Ion Implantation von Sukhanov, Yakov N., Ershov, Alexey P., Rudenko, Konstantin V., Orlikovsky, Alexander A.

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Tunnel field-effect transistors with graphene channels von Svintsov, D. A., Vyurkov, V. V., Lukichev, V. F., Orlikovsky, A. A., Burenkov, A., Oechsner, R.

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In memory of Kamil' Akhmetovich Valiev von Betelin, V B, Velikhov, Evgenii P, Gulyaev, Yurii V, Kokin, A A, Kopaev, Yurii V, Krasnikov, G Ya, Kuznetsov, F A, Lukichev, V F, Neizvestnyi, I G, Orlikovsky, Alexander A, Rakov, A V, Chaplygin, Yu A

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Image contrast in the backscattered electron mode in scanning electron microscopy and microtomography von Orlikovsky, N. A., Rau, E. I.

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Fine-line plasma-enhanced processes on the basis of a set of pilot units with a scalable inductively coupled plasma source for use in microelectronics von Orlikovsky, A. A., Rudenko, K. V., Averkin, S. N.

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Investigating the effect of amplitude and phase relaxation on the quality of quantum information technologies von Bogdanov, Yu. I., Bantysh, B. I., Chernyavskiy, A. Yu, Lukichev, V. F., Orlikovsky, A. A.

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Entanglement dynamics in quantum operations using superconducting phase qubits von Bogdanov, Yu I., Bantysh, B. I., Lukichev, V. F., Orlikovsky, A. A., Holevo, A. S.

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Evaluation of the effective threshold energy of the Interband impact ionization in a deep-submicron silicon n-channel MOS transistor von Borzdov, V. M., Borzdov, A. V., Speransky, D. S., V’yurkov, V. V., Orlikovsky, A. A.

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Operation of an electronic lithograph in the mode of a scanning electron microscope von Kal’nov, V. A., Novikov, Yu. A., Orlikovsky, A. A.

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The study of amplitude and phase relaxation impact on the quality of quantum information technologies von Bogdanov, Yu I, Bantysh, B I, A Yu Chernyavskiy, Lukichev, V F, Orlikovsky, A A

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Quantum noise and the quality control of hardware components of quantum computers based on superconducting phase qubits von Bogdanov, Yu. I., Lukichev, V. F., Nuyanzin, S. A., Orlikovsky, A. A.

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Boron Profile Sharpening in Ultra-Shallow p{sup +}-n Junction Produced by Plasma Immersion Ion Implantation from BF{sub 3} Plasma von Lukichev, V., Rudenko, K., Orlikovsky, A., Pustovit, A., Vyatkin, A.

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