Scanning probe microscope dimensional metrology at NIST von Kramar, John A, Dixson, Ronald, Orji, Ndubuisi G

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How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning von Neisser, Mark, Orji, Ndubuisi G., Levinson, Harry J., Celano, Umberto, Moyne, James, Mashiro, Supika, Wilcox, Dan, Libman, Slava

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Tip characterization method using multi-feature characterizer for CD-AFM von Orji, Ndubuisi G., Itoh, Hiroshi, Wang, Chumei, Dixson, Ronald G., Walecki, Peter S., Schmidt, Sebastian W., Irmer, Bernd

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Line edge roughness metrology using atomic force microscopes von Orji, Ndubuisi G, Vorburger, Theodore V, Fu, Joseph, Dixson, Ronald G, Nguyen, Cattien V, Raja, Jayaraman

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Traceable pico-meter level step height metrology von Orji, Ndubuisi G., Dixson, Ronald G., Fu, Joseph, Vorburger, Theodore V.

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Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks von Smith, S., Tsiamis, A., McCallum, M., Hourd, A.C., Stevenson, J.T.M., Walton, A.J., Dixson, R.G., Allen, R.A., Potzick, J.E., Cresswell, M.W., Orji, N.G.

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Line edge roughness metrology using atomic force microscopes von Orji, Ndubuisi G, Vorburger, Theodore V, Fu, Joseph, Dixson, Ronald G, Nguyen, Cattien V, Raja, Jayaraman

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Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging von Clarke, James S., Schmidt, Michael B., Orji, Ndubuisi G.

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Advanced metrology needs for nanoelectronics lithography von Knight, Stephen, Dixson, Ronald, Jones, Ronald L., Lin, Eric K., Orji, Ndubuisi G., Silver, R., Villarrubia, John S., Vladár, András E., Wu, Wen-li

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Advanced metrology needs for nanoelectronics lithography: Ultimate lithography von KNIGHT, Stephen, DIXSON, Ronald, JONES, Ronald L, LIN, Eric K, ORJI, Ndubuisi G, SILVER, R, VILLARRUBIA, John S, VLADAR, Andras E, WU, Wen-Li

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A Systematic Approach to Accurate Evaluation of CD-Metrology Tools von Orji, N.G., Bunday, B.D., Dixson, R.G., Allgair, J.A.

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