1.3-mW tunable and narrow-band continuous-wave light source at 191 nm von Scholz, Matthias, Opalevs, Dmitrijs, Leisching, Patrick, Kaenders, Wilhelm, Wang, Guiling, Wang, Xiaoyang, Li, Rukang, Chen, Chuangtian

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Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source von Vetter, Andreas, Kirner, Raoul, Opalevs, Dmitrijs, Scholz, Matthias, Leisching, Patrick, Scharf, Toralf, Noell, Wilfried, Rockstuhl, Carsten, Voelkel, Reinhard

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A bright continuous-wave laser source at 193 nm von Scholz, Matthias, Opalevs, Dmitrijs, Leisching, Patrick, Kaenders, Wilhelm, Wang, Guiling, Wang, Xiaoyang, Li, Rukang, Chen, Chuangtian

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Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm von Kirner, Raoul, Vetter, Andreas, Opalevs, Dmitrijs, Gilfert, Christian, Scholz, Matthias, Leisching, Patrick, Scharf, Toralf, Noell, Wilfried, Rockstuhl, Carsten, Voelkel, Reinhard

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Active and passive stabilization of a high-power UV frequency-doubled diode laser von Eismann, Ulrich, Enderlein, Martin, Simeonidis, Konstantinos, Keller, Felix, Rohde, Felix, Opalevs, Dmitrijs, Scholz, Matthias, Kaenders, Wilhelm, Stuhler, Jürgen

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Conversion of bright magneto-optical resonances into dark at fixed laser frequency for D2 excitation of atomic rubidium von Auzinsh, Marcis, Berzins, Andris, Ferber, Ruvin, Gahbauer, Florian, Kalvans, Linards, Mozers, Arturs, Opalevs, Dmitrijs

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Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source von Vetter, Andreas, Kirner, Raoul, Opalevs, Dmitrijs, Scholz, Matthias, Leisching, Patrick, Scharf, Toralf, Noell, Wilfried, Rockstuhl, Carsten, Voelkel, Reinhard

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Enabling proximity mask-aligner lithography with a 193nm CW light source von Owa, Soichi, Kye, Jongwook, Scholz, Matthias, Opalevs, Dmitrijs, Vetter, Andreas, Kirner, Raoul, Voelkel, Reinhard, Rockstuhl, Carsten, Noell, Wilfried, Scharf, Toralf, Leisching, Patrick

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Mask-aligner Talbot lithography using a 193 nm CW light source von Owa, Soichi, Kye, Jongwook, Voelkel, Reinhard, Rockstuhl, Carsten, Noell, Wilfried, Scharf, Toralf, Kirner, Raoul, Leisching, Patrick, Scholz, Matthias, Opalevs, Dmitrijs, Vetter, Andreas

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Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications von Shori, Ramesh K, Clarkson, W. Andrew, Stuhler, Juergen, Chen, Chuangtian, Noell, Wilfried, Leisching, Patrick, Wang, Xiao Yang, Liu, L. J, Li, Ru Kang, Voelkel, Reinhard, Scharf, Toralf, Rockstuhl, Carsten, Kirner, Raoul, Vetter, Andreas, Gilfert, Christian, Scholz, Matthias, Opalevs, Dmitrijs

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