Electron holography of devices with epitaxial layers von Gribelyuk, M. A., Ontalus, V., Baumann, F. H., Zhu, Z., Holt, J. R.

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Electron Holography of CMOS Devices with Epitaxial Layers von Gribelyuk, M. A., Ontalus, V., Adam, T. N., Baumann, F. H., Ronsheim, P. R.

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Electron holography of Si:C films and Si:C-based devices von Gribelyuk, M. A., Adam, T. N., Ontalus, V., Ronsheim, P. R., Kimball, L., Schonenberg, K. T.

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Crystallization behaviour and phase coexistence at morphotrophic phase boundaries in PZT thin films prepared by sol-gel processing von ONTALUS, V, COBIANU, C, VASILIU, F, PARLOG, C

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Ultra-thin Gate Dielectric Plasma Charging Damage in SOI Technology von Lai, W., Harmon, D., Hook, T., Ontalus, V., Gambino, J.

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Phase Coexistence at MPB in PZT Thin Films prepared by Sol-Gel Processing von Parlog, C., Vasiliu, F., Ontalus, V., Ianculescu, A., Cobianu, C.

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22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL von Narasimha, S., Chang, P., Ortolland, C., Fried, D., Engbrecht, E., Nummy, K., Parries, P., Ando, T., Aquilino, M., Arnold, N., Bolam, R., Cai, J., Chudzik, M., Cipriany, B., Costrini, G., Dai, M., Dechene, J., DeWan, C., Engel, B., Gribelyuk, M., Guo, D., Han, G., Habib, N., Holt, J., Ioannou, D., Jagannathan, B., Jaeger, D., Johnson, J., Kong, W., Koshy, J., Krishnan, R., Kumar, A., Kumar, M., Lee, J., Li, X., Lin, C., Linder, B., Lucarini, S., Lustig, N., McLaughlin, P., Onishi, K., Ontalus, V., Robison, R., Sheraw, C., Stoker, M., Thomas, A., Wang, G., Wise, R., Zhuang, L., Freeman, G., Gill, J., Maciejewski, E., Malik, R., Norum, J., Agnello, P.

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CRYSTALLISATION BEHAVIOUR AND PHASE COEXISTENCE AT MORPHOTROPIC von Ontalus, V, Cobianu, C, Vasiliu, F, Parlog, C

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CRYSTALLISATION BEHAVIOUR AND PHASE COEXISTENCE AT MORPHOTROPIC PHASE BOUNDARIES IN PZT THIN FILMS PREPARED BY SOL-GEL PROCESSING von Ontalus, V, Cobianu, C, Vasiliu, F, Parlog, C

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High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography von Agnello, P., Ivers, T., Warm, C., Wise, R., Wachnik, R., Schepis, D., Sankaran, S., Norum, J., Luning, S., Li, Y., Khare, M., Grill, A., Edelstein, D., Chen, X., Brown, D., Augur, R., Wu, S., Yu, J., Wong, R.C., Werking, J., Wehella-Gamage, D., Vayshenker, A., Van Meer, H., Van Den Nieuwenhuizen, R., Tian, C., Tabakman, K., Sung, C.Y., Standaert, T., Simon, A., Sim, J., Sheraw, C., Restaino, D., Rausch, W., Pal, R., Prindle, C., Ouyang, X., Ouyang, C., Ontalus, V., Nummy, K., Nielsen, D., Nicholson, L., McKnight, A., Lustig, N., Liu, X., Lee, M.H., Lea, D., Larosa, G., Landers, W., Kim, B., Kelling, M., Jeng, S.-J., Holt, J., Hargrove, M., Grunow, S., Greco, S., Gates, S., Frye, A., Fisher, P., Domenicucci, A., Dimitrakopoulos, C., Costrini, G., Chou, A., Cheng, J., Butt, S., Black, L., Belyansky, M., Ahsan, I., Adam, T., Gabor, A., Wu, C.-H.J., Yang, D., Crouse, M., Robinson, C., Corliss, D., Fonseca, C., Johnson, J., Weybright, M., Waite, A., Nayfeh, H.M., Onishi, K., Narasimha, S.

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CMOS gate height scaling von Zhibin Ren, Schonenberg, K.T., Ontalus, V., Lauer, I., Butt, S.A.

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PbTiO/sub 3/ films via sol-gel von Parlog, C., Gartner, M., Ontalus, V., Cobianu, C., Dascalu, D.

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Microstructure-optical properties correlation in PZT films von Parlog, C., Gartner, M., Ontalus, V., Ghita, C., Cobianu, C., Dascalu, D.

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