ZnO-nanoparticle-coated carbon nanotubes demonstrating enhanced electron field-emission properties von Green, Joshua M., Dong, Lifeng, Gutu, Timothy, Jiao, Jun, Conley, John F., Ono, Yoshi

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Dielectrophoretically Controlled Fabrication of Single-Crystal Nickel Silicide Nanowire Interconnects von Dong, Lifeng, Bush, Jocelyn, Chirayos, Vachara, Solanki, Raj, Jiao, Jun, Ono, Yoshi, Conley, John F, Ulrich, Bruce D

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Role of O ( 1 D) in the oxidation of Si(100) von Kaspar, Tiffany, Tuan, Allan, Tonkyn, Russell, Hess, Wayne P., Rogers, J. W., Ono, Yoshi

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Photoluminescence and Electroluminescence Studies on Tb-Doped Silicon Rich Oxide Materials and Devices von Gao, Wei, Li, Ting-kai, Ono, Yoshi, Hsu, Sheng-Teng

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Selective growth and directed integration of ZnO nanobridge devices on si substrates without a metal catalyst using a ZnO seed layer von Conley, John F., Stecker, Lisa, Ono, Yoshi

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Directed integration of ZnO nanobridge devices on a Si substrate von Conley, John F., Stecker, Lisa, Ono, Yoshi

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Effect of interlayer on thermal stability of nickel silicide von Maa, Jer-shen, Ono, Yoshi, Tweet, Douglas J., Zhang, Fengyan, Hsu, Sheng Teng

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Interface control in the chemical vapor deposition of titanium dioxide on silicon(100) von Tuan, Allan, Yoon, Meeyoung, Medvedev, Valentin, Ono, Yoshi, Ma, Yanjun, Rogers, J.W

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Floating-Potential Dielectrophoresis-Controlled Fabrication of Single-Carbon-Nanotube Transistors and Their Electrical Properties von Dong, Lifeng, Chirayos, Vachara, Bush, Jocelyn, Jiao, Jun, Dubin, Valery M, Chebian, Ramanan V, Ono, Yoshi, Conley, John F, Ulrich, Bruce D

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Fatigue free ferroelectric Pb5Ge3O11 thin films prepared by metalorganic chemical vapor deposition von Li, Tingkai, Zhang, Fengyan, Ono, Yoshi, Hsu, Sheng Teng

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Selective growth and directed integration of ZnO nanobridge devices on si substrates without a metal catalyst using a ZnO seed layer: Group III Nitrides, SiC, and ZnO von CONLEY, John F, STECKER, Lisa, ONO, Yoshi

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Fabrication and characterization of a Pb5Ge3O11 one-transistor-memory device von Li, Tingkai, Hsu, Sheng Teng, Ulrich, Bruce, Ying, Hong, Stecker, Lisa, Evans, Dave, Ono, Yoshi, Maa, Jer-shen, Lee, J. J.

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Method of making a non-volatile memory using a plasma oxidized high-k charge-trapping layer von ONO YOSHI

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Method of making a non-volatile memory using a plasma oxidized high-k charge-trapping layer von Ono, Yoshi

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MANUFACTURING METHOD OF NONVOLATILE MEMORY USING PLASMA OXIDIZED HIGH-K CHARGE TRAPPING LAYER von ONO YOSHI

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Method of making a non-volatile memory using a plasma oxidized high-k charge-trapping layer von ONO YOSHI

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NITRIDING AT LOW TEMPERATURE OF SILICON von YOSHI ONO

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Low temperature nitridation of silicon von ONO YOSHI

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Low temperature nitridation of silicon von Ono, Yoshi

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LOW TEMPERATURE OXIDATION METHOD OF SILICON USING NITROUS OXIDE von ONO YOSHI

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