Thermal and electrical properties of Au/B4C, Ni/B4C, and Ta/Si contacts to silicon carbide von OLOWOLAFE, J. O, SOLOMON, J. S, MITCHEL, W, LAMPERT, W. V

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Electrical conduction and dielectric breakdown in aluminum oxide insulators on silicon von Kolodzey, J., Chowdhury, E.A., Adam, T.N., Guohua Qui, Rau, I., Olowolafe, J.O., Suehle, J.S., Yuan Chen

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Effect of composition on thermal stability and electrical resistivity of Ta–Si–N films von Olowolafe, J.O, Rau, I, Unruh, K.M, Swann, C.P, Jawad, Z.S, Alford, T

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Band gap bowing and refractive index spectra of polycrystalline AlxIn1−xN films deposited by sputtering von Peng, T., Piprek, J., Qiu, G., Olowolafe, J. O., Unruh, K. M., Swann, C. P., Schubert, E. F.

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Effects of anneal ambients and Pt thickness on Pt/Ti and Pt/Ti/TiN interfacial reactions von OLOWOLAFE, J. O, JONES, R. E, CAMPBELL, A. C, HEGDE, R. I, MOGAB, C. J, GREGORY, R. B

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Interdiffusions in Cu/reactive-ion-sputtered TiN, Cu/chemical-vapor-deposited TiN, Cu/TaN, and TaN/Cu/TaN thin-film structures : low temperature diffusion analyses von OLOWOLAFE, J. O, MOGAB, C. J, GREGORY, R. B, KOTTKE, M

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Effects of oxygen in TiNx on the diffusion of Cu in Cu/TiN/Al and Cu/TiNx/Si structures von OLOWOLAFE, J. O, JIAN LI, MAYER, J. W, COLGAN, E. G

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Preparation and characterization of MOCVD thin films of indium tin oxide von Akinwunmi, O.O, Eleruja, M.A, Olowolafe, J.O, Adegboyega, G.A, Ajayi, E.O.B

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The effects of oxidation temperature on the capacitance–voltage characteristics of oxidized AlN films on Si von Kolodzey, J., Chowdhury, E. A., Qui, G., Olowolafe, J., Swann, C. P., Unruh, K. M., Suehle, J., Wilson, R. G., Zavada, J. M.

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Thermally oxidized AlN thin films for device insulators von Chowdhury, E. A., Kolodzey, J., Olowolafe, J. O., Qiu, G., Katulka, G., Hits, D., Dashiell, M., van der Weide, D., Swann, C. P., Unruh, K. M.

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Effect of Si or Al interface layers on the properties of Ta and Mo contacts to p-type SiC von Olowolafe, J. O., Liu, J., Gregory, R. B.

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Electrical characteristics of paraelectric lead lanthanum zirconium titanate thin films for dynamic random access memory applications von JONES, R. E, MANIAR, P. D, OLOWOLAFE, J. O, CAMPBELL, A. C, MOGAB, C. J

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Preparation and optical characterization of MOCVD ZnCdInS thin films von Adedeji, A.V, Eleruja, M.A, Ojo, I.A.O, Djebah, A, Osasona, O, Olowolafe, J.O, Aladekomo, J.B, Ajayi, E.O.B

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Analysis of high-temperature materials for application to electric weapon technology von Katulka, G.L., Kolodzey, J., Olowolafe, J.

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The effect of Ta to Si ratio on magnetron sputtered Ta-Si-N thin films von Olowolafe, J O, Rau, I, Unruh, K M, Swann, C P, Jawad, Z, Alford, T

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Intermetallic Compound Formation in Ti/Al Alloy Thin Film Couples and Its Role in Electromigration Lifetime von Jawarani, D., Stark, J. P., Kawasaki, H., Olowolafe, J. O., Lee, C. C., Klein, J., Pintchovski, F.

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Structural, optical and electronic properties of oxidized ain thin films at different temperatures von ENAM AHMED CHOWDHURY, DASHIELL, M, SUEHLE, J, CHEN, Y, QIU, G, OLOWOLAFE, J. O, JONCZYK, R, SMITH, D, BARNETT, A, KOLODZEY, J, UNRUH, K. M, SWANN, C. P

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Evaluation of Ta, Ti and TiW encapsulations for corrosion and diffusion protection of Cu interconnects von Olowolafe, J.O., Mogab, C.J., Gregory, R.B.

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Electrical and optical properties of phosphorus doped Ge1-yCy von DASHIELL, M. W, TROEGER, R. T, ROE, K. J, KHAN, A.-S, ORNER, B, OLOWOLAFE, J. O, BERGER, P. R, WILSON, R. G, KOLODZEY, J

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Effect of interface layer on the microstructure and electromigration resistance of Al-Si-Cu alloy on TiN/Ti substrates von OLOWOLAFE, J. O, KAWASAKI, H, LEE, C. C, KLEIN, J, PINTCHOVSKI, F, JAWARANI, D

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