The mechanism of radiation-induced compaction in vitreous silica von Piao, Fan, Oldham, William G., Haller, Eugene E.

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Ultraviolet-induced densification in fused silica von Schenker, Richard E., Oldham, William G.

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Ultraviolet-induced densification of fused silica von Piao, Fan, Oldham, William G., Haller, Eugene E.

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Mirror-based pattern generation for maskless lithography von OLDHAM, William G, SHROFF, Yashesh

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Mirror-based pattern generation for maskless lithography von Oldham, William G., Shroff, Yashesh

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Plasma etch effects on low-temperature selective epitaxial growth of silicon von JEN-CHUNG LOU, OLDHAM, W. G, KAWAYOSHI, H, LING, P

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The surface morphology of selectively grown epitaxial silicon von JEN-CHUNG LOU, OLDHAM, W. G, KAWAYOSHI, H, PEICHING LING

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The effect of hydrogen on boron diffusion in SiO2 von SHACHAM-DIAMAND, Y, OLDHAM, W. G

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Carrier recombination through donors/acceptors in heavily doped silicon von Hu, Chenming, Oldham, William G.

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The Fabrication of Microelectronic Circuits von Oldham, William G.

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Modeling of stress effects in silicon oxidation von Sutardja, P., Oldham, W.G.

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Dichlorosilane effects on low-temperature selective silicon epitaxy von JEN-CHUNG LOU, GALEWSKI, C, OLDHAM, W. G

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Diffuser speckle model: application to multiple moving diffusers von Partlo, W N, Oldham, W G

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A hot+-wall low-pressure reactor for selective silicon epitaxy : reactor design and experimental results von GALEWSKI, C, OLDHAM, W. G

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Thin dielectric degradation during silicon selective epitaxial growth process von Shih, Yang-Chin, Zhang, Guobiao, Hu, Chenming, Oldham, William G.

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A general simulator for VLSI lithography and etching processes: Part I-Application to projection lithography von Oldham, W.G., Nandgaonkar, S.N., Neureuther, A.R., O'Toole, M.

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Seam line defects in silicon-on-insulator by merged epitaxial lateral overgrowth von Shih, Yang-Chin, Lou, Jen-Chung, Oldham, William G.

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The use of contrast enhancement layers to improve the effective contrast of positive photoresist von Oldham, W.G.

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Development of positive photoresist von Deok Jung Kim, Oldham, W.G., Neureuther, A.R.

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193-nm lithographic system lifetimes as limited by UV compaction von OLDHAM, W. G, SCHENKER, R. E

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