Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements von Okorn-Schmidt, Harald F., Holsteyns, Frank, Lippert, Alexander, Mui, David, Kawaguchi, Mark, Lechner, Christiane, Frommhold, Philipp E., Nowak, Till, Reuter, Fabian, Piqué, Miquel Banchs, Cairós, Carlos, Mettin, Robert

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Enhancement of semiconductor wafer cleaning by chelating agent addition von GALE, Glenn W, RATH, David L, COOPER, Emanuel I, ESTES, Scott, OKORN-SCHMIDT, Harald F, BRIGANTE, Jeffrey, JAGANNATHAN, R, SETTEMBRE, Greg, ADAMS, Ed

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(Invited) Particle Cleaning Technologies to Meet Advanced Semiconductor Device Process Requirements von Okorn-Schmidt, Harald F., Holsteyns, Frank, Lippert, Alexander, Mui, David, Kawaguchi, Mark, Lechner, Christiane, Frommhold, Philipp E., Nowak, Till, Mettin, Robert

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Process Parameter Control for BEOL TiN Hard Mask Etch-Back von Engesser, Philipp, Linder, Manuel, Hofer-Moser, Jörg, Okorn-Schmidt, Harald

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Using Deionized Water to Remove Polystyrene Latex Particles from Oxide Layer by Single-Wafer Spin Processing von Kinoshita, Kei, Engesser, Philipp, Okorn-Schmidt, Harald

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Tris(Trimethylsilyl)Germane (Me3Si)3GeH: A Molecular Model for Sulfur Passivation of Ge(111) Surfaces von Engesser, Philipp, Okorn, Gilbert, Fischer, Roland, Okorn-Schmidt, Harald, Steller, Beate

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Surface Cleaning of SiGe(100) and Passivation of Ge(100) with Aqeuous Ammonium Sulfide von Heslop, Stacy Lynn, Engesser, Philipp, Okorn-Schmidt, Harald F., Muscat, Anthony J.

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The Risk of Pattern Collapse for Structures in Future Logic Devices von Peter, Daniel, Sankarapandian, M., Okorn-Schmidt, Harald, Peethala, B., Canaperi, D., Engesser, Philipp

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공정 가스로 기판을 처리하기 위해 공정 가스를 분배하는 분배 몸체 von KOLITSCH MATALN MARIANNE, GLEISSNER ANDREAS, OKORN SCHMIDT HARALD

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기판의 화학적 표면 처리 및/또는 전해 표면 처리를 위한 공정 유체를 위한 분배체 von ENGESSER PHILIPP, GLEISSNER ANDREAS, OKORN SCHMIDT HARALD

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Electrophoretic Studies on Silicon Nitride: Traces of Silicates in UPW Shift Zeta Potential Similar to SC-1 von Pfeuffer, Alexander, Okorn-Schmidt, Harald, Bensch, Wolfgang, Lechner, Alfred

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Cleaning of semiconductor substrates by controlled cavitation von Holsteyns, Frank, Lippert, Alexander, Lechner, Florian, Otto, Andrea, Nowak, Till, Mettin, Robert, Doinikov, Alexander A., Okorn-Schmidt, Harald

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기판의 화학적 표면 처리 및/또는 전해 표면 처리를 위한 공정 유체용 차폐체 시스템 von OETZLINGER HERBERT, KOLITSCH MATALN MARIANNE, OKORN SCHMIDT HARALD, GLEISSNER ANDREAS

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Behaviour of a Well-Designed Megasonic Cleaning System von Kumnig, Franz, Pfeuffer, Alexander, Köffler, Martin, Obweger, Rainer, Okorn-Schmidt, Harald, Leberzammer, Jörg, Ferrell, Garry, Klitzke, J., Engesser, P., Lippert, Alexander, Sax, Harry

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DISTRIBUTION BODY FOR A PROCESS FLUID FOR CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT OF A SUBSTRATE von OKORN-SCHMIDT, Harald, GLEISSNER, Andreas, ENGESSER, Philipp

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DISTRIBUTION BODY FOR DISTRIBUTING A PROCESS GAS FOR TREATING A SUBSTRATE BY MEANS OF THE PROCESS GAS von KOLITSCH-MATALN, Marianne, OKORN-SCHMIDT, Harald, GLEISSNER, Andreas

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The Active Role of Etch Products in Particle Removal by SC-1 Solutions von Pfeuffer, Alexander, Okorn-Schmidt, Harald, Bensch, Wolfgang, Lechner, Alfred

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SHIELD BODY SYSTEM FOR A PROCESS FLUID FOR CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT OF A SUBSTRATE von KOLITSCH-MATALN, Marianne, OKORN-SCHMIDT, Harald, ÖTZLINGER, Herbert, GLEISSNER, Andreas

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SHIELD BODY SYSTEM FOR A PROCESS FLUID FOR CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT OF A SUBSTRATE von KOLITSCH-MATALN, Marianne, OKORN-SCHMIDT, Harald, ÖTZLINGER, Herbert, GLEISSNER, Andreas

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DISTRIBUTION BODY FOR DISTRIBUTING A PROCESS GAS FOR TREATING A SUBSTRATE BY MEANS OF THE PROCESS GAS von KOLITSCH-MATALN, Marianne, OKORN-SCHMIDT, Harald, GLEISSNER, Andreas

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