Highly angular dependent high-contrast grating mirror and its application for transverse-mode control of VCSELs von Inoue, Shunya, Kashino, Junichi, Matsutani, Akihiro, Ohtsuki, Hideo, Miyashita, Takahiro, Koyama, Fumio

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Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl2/Xe-Inductively Coupled Plasma Etching von Matsutani, Akihiro, Hashidume, Yuuki, Ohtsuki, Hideo, Koyama, Fumio

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Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas Source von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Reactive Ion Etching of Si Using Ar/F2 Plasma von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas Source von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Solid Source Dry Etching Process for GaAs and InP von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Vertical and Smooth Etching of InP by Cl 2 /Xe Inductively Coupled Plasma von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio, Iga, Kenichi

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Iodine Solid Source Inductively Coupled Plasma Etching of InP von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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LOW-TEMPERATURE DRY ETCHING OF InP BY INDUCTIVELY COUPLED PLASMA USING HI/Cl2 von Matsutani, A, Ohtsuki, H, Koyama, F

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Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl 2 /Xe-Inductively Coupled Plasma Etching von Matsutani, Akihiro, Hashidume, Yuuki, Ohtsuki, Hideo, Koyama, Fumio

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Reactive Ion Etching of Si Using Ar/F 2 Plasma von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Vertical and Smooth Microfabrication of InP Using Simple High-Density Plasma System with SmCo Ring Magnet von Matsutani, Akihiro, Ohtsuki, Hideo, Ohashi, Ken, Yokoyama, Tomonori, Yamakage, Hirokazu, Koyama, Fumio

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Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl 2 /Xe-Inductively Coupled Plasma Etching von Matsutani, Akihiro, Hashidume, Yuuki, Ohtsuki, Hideo, Koyama, Fumio

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In situ Observation of Etching Profile in Inductively Coupled Plasma Etching of GaAs and InP using Long Distance Microscope von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP von Matsutani, Akihiro, Ohtsuki, Hideo, Muta, Seiichi, Koyama, Fumio, Iga, Kenichi

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Cl2-BASED INDUCTIVELY COUPLED PLASMA ETCHING OF InP USING INTERNAL ANTENNA von Matsutani, A, Ohtsuki, H, Koyama, F

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Measurement of Plasma Density for Control of Etching Profile in Inductively Coupled Plasma Etching of InP von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio, Iga, Kenichi

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Smooth and Vertical Profile Dry Etching of Si Using XeF 2 Plasma von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Generation of Solid-Source H 2 O Plasma and Its Application to Dry Etching of CaF 2 von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl 2 von Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio

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