Effective synthesis of diiodinated picene and dibenzo[a,h]anthracene by AuCl-catalyzed double cyclization von Nakae, Takahiro, Ohnishi, Ryuji, Kitahata, Yoshiharu, Soukawa, Tatsuya, Sato, Hisako, Mori, Shigeki, Okujima, Tetsuo, Uno, Hidemitsu, Sakaguchi, Hiroshi

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Benzylation of α-Diimine Ligands Bound to Zirconium and Hafnium. A New Convenient Route to Olefin Polymerization Catalysts von Mashima, Kazushi, Ohnishi, Ryuji, Yamagata, Tsuneaki, Tsurugi, Hayato

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Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation von Kozawa, Takahiro, Tagawa, Seiichi, Ohnishi, Ryuji, Endo, Takafumi, Sakamoto, Rikimaru

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Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation von Kozawa, Takahiro, Tagawa, Seiichi, Ohnishi, Ryuji, Endo, Takafumi, Sakamoto, Rikimaru

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Pattern Replication in EUV Interference Lithography von Suzuki, Shota, Fukushima, Yasuyuki, Ohnishi, Ryuji, Watanabe, Takeo, Kinoshita, Hiroo

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Development of Under Layer Material for EUV Lithography von Sakamoto, Rikimaru, Ho, Bang-Ching, Fujitani, Noriaki, Endo, Takafumi, Ohnishi, Ryuji

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Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist von Fukushima, Yasuyuki, Watanabe, Takeo, Ohnishi, Ryuji, Shiotani, Hideaki, Suzuki, Shota, Hayakawa, Masamichi, Endo, Yusuke, Yamanaka, Tomotaka, Yusa, Shinichi, Kinoshita, Hiroo

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PAG Study of PAG Bonded Resist for EUV and EB Lithography von Fukushima, Yasuyuki, Watanab, Takeo, Ohnishi, Ryuji, Kinoshita, Hiroo, Suzuki, Shota, Yusa, Shinichi, Endo, Yusuke, Hayakawa, Masamichi, Yamanaka, Tomotaka

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Development of Low Line Edge Roughness and Highly Sensitive Resist for Extreme Ultraviolet Lithography von Fukushima, Yasuyuki, Watanabe, Takeo, Ohnishi, Ryuji, Shiotani, Hideaki, Suzuki, Shouta, Hayakawa, Masamichi, Ogi, Satoshi, Endo, Yusuke, Yamanaka, Tomotaka, Yusa, Shinichi, Kinoshita, Hiroo

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Mitigation of Low LER with PAG Bonded Resist for EUVL von Fukushima, Yasuyuki, Watanabe, Takeo, Ohnishi, Ryuji, Kinoshita, Hiroo, Shiotani, Hideaki, Suzuki, Shouta, Hayakawa, Masamichi, Endo, Yusuke, Yamanaka, Tomotaka, Yusaa, Shinichi

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Controlled Benzylation of α-Diimine Ligands Bound to Zirconium and Hafnium: An Alternative Method for Preparing Mono- and Bis(amido)M(CH2Ph) n (n = 2, 3) Complexes as Catalyst Prec... von Tsurugi, Hayato, Ohnishi, Ryuji, Kaneko, Hiroshi, Panda, Tarun K, Mashima, Kazushi

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Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist von Ohnishi, Ryuji, Watanabe, Takeo, Fukushima, Yasuyuki, Osugi, Masafumi, Kinoshita, Hiroo

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Benzylation of [alpha]-Diimine Ligands Bound to Zirconium and Hafnium. A New Convenient Route to Olefin Polymerization Catalysts von Mashima, Kazushi, Ohnishi, Ryuji, Yamagata, Tsuneaki, Tsurugi, Hayato

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Dual Grating Interferometric Lithography for 22-nm Node von Shiotani, Hideaki, Suzuki, Shota, Lee, Dong Gun, Naulleau, Patrick, Fukushima, Yasuyuki, Ohnishi, Ryuji, Watanabe, Takeo, Kinoshita, Hiroo

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Extreme Ultraviolet Resist Development at the University of Hyogo von Watanabe, Takeo, Fukushima, Yasuyuki, Shiotani, Hideaki, Ohnishi, Ryuji, Suzuki, Shota, Kinoshita, Hiroo, Yusa, Shinichi

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Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same von Sakamoto Rikimaru, Fujitani Noriaki, Ohnishi Ryuji

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Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound von Nishita, Tokio, Ohnishi, Ryuji, Mizuochi, Ryuta, Sakaida, Yasushi, Sakamoto, Rikimaru

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Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same von Sakamoto Rikimaru, Ho BangChing, Ohnishi Ryuji

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Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same von Endo Takafumi, Sakamoto Rikimaru, Fujitani Noriaki, Ohnishi Ryuji

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RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME von OHNISHI RYUJI, FUJITANI NORIAKI, SAKAMOTO RIKIMARU

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