Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute von Seshimo, Takehiro, Maeda, Rina, Odashima, Rin, Takenaka, Yutaka, Kawana, Daisuke, Ohmori, Katsumi, Hayakawa, Teruaki

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Challenges to Overcome Trade-off between High Resolution and High Sensitivity in EUV Lithography von Matsuzawa, Kensuke, Fujii, Tatsuya, Matsumaru, Shogo, Yamada, Tomotaka, Komuro, Yoshitaka, Kawana, Daisuke, Ohmori, Katsumi

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Perpendicularly Oriented Cylinders of Si-containing Block Copolymers by Atmospheric Thermal Annealing von Seshimo, Takehiro, Odashima, Rin, Maeda, Rina, Takenaka, Yutaka, Kawana, Daisuke, Ohmori, Katsumi, Hayakawa, Teruaki

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Silicon Infiltration into Functional Polymer for Nano-scale Pattern Development von Yamada, Kazuki, Yamato, Masatoshi, Oyama, Kenichi, Yaegashi, Hidetami, Seshimo, Takehiro, Ohmori, Katsumi, Tanaka, Daisuke, Koshiyama, Jun

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Ionic Liquid for Directed Self-Assembly of PS-b-PMMA von Kawaue, Akiya, Matsumiya, Tasuku, Seo, Takehito, Maehashi, Takaya, Seshimo, Takehiro, Yamano, Hitoshi, Miyagi, Ken, Dazai, Takahiro, Chen, Xuanxuan, Rincon-Delgadillo, Paulina, Gronheid, Roel, Nealey, Paul F., Ohmori, Katsumi

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Acid Quantum Efficiency of Anion-bound Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation von Komuro, Yoshitaka, Kawana, Daisuke, Hirayama, Taku, Ohmori, Katsumi, Kozawa, Takahiro

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EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement von Emura, Kazuya, Watanabe, Takeo, Yamaguchi, Masato, Tanino, Hirohito, Fukui, Tsubasa, Shiono, Daiju, Haruyama, Yuichi, Muramatsu, Yasuji, Ohmori, Katsumi, Sato, Kazufumi, Harada, Tetsuo, Kinoshita, Hiroo

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EUV Resist Chemical Reaction Analysis using SR von Watanabe, Takeo, Emura, Kazuya, Shiono, Daiju, Haruyama, Yuichi, Muramatsu, Yasuji, Ohmori, Katsumi, Sato, Kazufumi, Harada, Tetsuo, Kinoshita, Hiroo

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Silicon Infiltration into Functional Polymer for Nano-scale Pattern Development von Yamada, Kazuki, Yamato, Masatoshi, Oyama, Kenichi, Yaegashi, Hidetami, Seshimo, Takehiro, Ohmori, Katsumi, Tanaka, Daisuke, Koshiyama, Jun

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P‐54: Development of Heat Free / Low Temperature Process High Refractive Index Materials for Display von Urakawa, Kazuki, Chisaka, Hiroki, Hikida, Jiro, Yamanouchi, Atsushi, Shiota, Dai, Ohmori, Katsumi

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Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer von Yamamoto, Hiroki, Kozawa, Takahiro, Tagawa, Seiichi, Ohmori, Katsumi, Sato, Mitsuru, Komano, Hiroji

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Study of Pattern Collapse for Freezing Free Litho-Litho-Etch Double Patterning von Yokoya, Jiro, Nakamura, Tsuyoshi, Takeshita, Masaru, Yoshii, Yasuhiro, Saito, Hirokuni, Takasu, Ryoichi, Matsumiya, Tasuku, Ohmori, Katsumi

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P‐57: Preparation of Patternable High Resolution and High Refractive Index Materials for AR/VR von Hikida, Jiro, Chisaka, Hiroki, Ijima, Yoichiro, Liao, Yuehchun, Konno, Kenri, Hirano, Isao, Misumi, Kouichi, Shiota, Dai, Ohmori, Katsumi

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Resist Development Status for Immersion Lithography von Tsuji, Hiromitsu, Yoshida, Masaaki, Ishiuka, Keita, Hirano, Tomoyuki, Endo, Kotaro, Ohmori, Katsumi

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LENS APPARATUS AND IMAGING APPARATUS von Ohmori, Katsumi

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Lens apparatus and imaging apparatus von Ohmori, Katsumi

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LENS APPARATUS, IMAGE PICKUP APPARATUS, AND IMAGE PICKUP SYSTEM von Ohmori, Katsumi

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Lens apparatus and imaging system using the same von Ohmori, Katsumi

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LENS APPARATUS AND IMAGING SYSTEM USING THE SAME von Ohmori, Katsumi

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LENS APPARATUS AND IMAGING APPARATUS von Ohmori, Katsumi

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