Preparation of a-Si:H films resistive to the Staebler-Wronski effect von YAMAZAKI, M, OHAGI, H, NAKATA, J, IMAO, S, SHIRAFUJI, J, FUJIBAYASHI, K, INUISHI, Y

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Saturation of optical degradation in a-Si:H films with different morphologies von OHAGI, H, NAKATA, J, MIYANISHI, A, IMAO, S, JEONG, M, SHIRAFUJI, J, FUJIBAYASHI, K, INUISHI, Y

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Optical Degradation of a-Si:H films with Different Morphology von OHAGI, H, YAMAZAKI, M, NAKATA, J.-I, IMAO, S, SHIRAFUJI, J, FUJIBAYASHI, K, INUISHI, Y

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Staebler-wronski effect in a-Si:H films with different morphology von Ohagi, Hideki, Yamazaki, Motoharu, Nakata, Jun-ichi, Imao, Shozo, Shirafuji, Junji, Fujibayashi, Keiji, Inuishi, Yoshio

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Semiconductor integrated circuit device von OHAGI, HIDEKI, NOTO, TAKAYUKI, OI, EIJI, SHIOTSUKI, YAHIRO, KATO, KAZUO

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Semiconductor intergrated circuit device von OHAGI HIDEKI, KATO KAZUO, NOTO TAKAYUKI, SHIOTSUKI YAHIRO, OI EIJI

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Semiconductor integrated circuit device von OHAGI, HIDEKI, SHIOTSUKI, YAHIRO, KATO, KAZUO, NOTO, TAKAYUKI, OI, EIJI

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