Two-dimensional gratings-based phase-contrast imaging using a conventional x-ray tube von SATO, Genta, KONDOH, Takeshi, DEN, Toru, ITOH, Hidenosuke, HANDA, Soichiro, YAMAGUCHI, Kimiaki, NAKAMURA, Takashi, NAGAI, Kentaro, OUCHI, Chidane, TESHIMA, Takayuki, SETOMOTO, Yutaka

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Development of optical coatings for 157-nm lithography. I. Coating materials von Niisaka, Shunsuke, Saito, Tadahiko, Saito, Jun, Tanaka, Akira, Matsumoto, Akira, Otani, Minoru, Biro, Ryuji, Ouchi, Chidane, Hasegawa, Masanobu, Suzuki, Yasuyuki, Sone, Kazuho

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Two-dimensional grating-based X-ray phase-contrast imaging using Fourier transform phase retrieval von Itoh, Hidenosuke, Nagai, Kentaro, Sato, Genta, Yamaguchi, Kimiaki, Nakamura, Takashi, Kondoh, Takeshi, Ouchi, Chidane, Teshima, Takayuki, Setomoto, Yutaka, Den, Toru

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Wavefront Metrology for EUV Projection Optics by Soft X-ray interferometry in the NewSUBARU von Niibe, Masahito, Sugisaki, Katsumi, Okada, Masashi, Kato, Seima, Ouchi, Chidane, Hasegawa, Takayuki

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Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement von Otani, Minoru, Biro, Ryuji, Ouchi, Chidane, Hasegawa, Masanobu, Suzuki, Yasuyuki, Sone, Kazuho, Niisaka, Shunsuke, Saito, Tadahiko, Saito, Jun, Tanaka, Akira, Matsumoto, Akira

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Shearing Interferometry for at Wavelength Wavefront Measurement of Extreme-Ultraviolet Lithography Projection Optics von Zhu, Yucong, Sugisaki, Katsumi, Murakami, Katsuhiko, Ota, Kazuya, Kondo, Hiroyuki, Ishii, Mikihiko, Kawakami, Jun, Oshino, Tetsuya, Saito, Jun, Suzuki, Akiyoshi, Hasegawa, Masanobu, Sekine, Yoshiyuki, Takeuchi, Seiji, Ouchi, Chidane, Kakuchi, Osamu, Watanabe, Yutaka, Hasegawa, Takayuki, Hara, Shinichi

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Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography von Zhu, Yucong, Sugisaki, Katsumi, Okada, Masashi, Otaki, Katsura, Liu, Zhiqiang, Kawakami, Jun, Ishii, Mikihiko, Saito, Jun, Murakami, Katsuhiko, Hasegawa, Masanobu, Ouchi, Chidane, Kato, Seima, Hasegawa, Takayuki, Suzuki, Akiyoshi, Yokota, Hideo, Niibe, Masahito

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Fiber-laser-based stimulated Raman scattering microscope in fingerprint region with a Neodymium doped fiber laser at 920 nm von Yonetani, Yuki, Kohara, Naoki, Ishikawa, Michio, Ouchi, Chidane, Ozeki, Yasuyuki

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Video-rate spectral imaging with fiber-laser-based stimulated Raman scattering microscope von Kohara, Naoki, Ishikawa, Michio, Yonetani, Yuki, Ouchi, Chidane, Ozeki, Yasuyuki

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Label-free Observation and Principle Component Analysis of Mouse Tissue by Video-rate Stimulated Raman Scattering Microscope von Otsuka, Yoichi, Ozeki, Yasuyuki, Satoh, Shuya, Umemura, Wataru, Hashimoto, Hiroyuki, Ouchi, Chidane, Itoh, Kazuyoshi

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Single-shot X-ray phase-contrast imaging using two-dimensional gratings von Sato, Genta, Itoh, Hidenosuke, Nagai, Kentaro, Nakamura, Takashi, Yamaguchi, Kimiaki, Kondoh, Takeshi, Handa, Soichiro, Ouchi, Chidane, Teshima, Takayuki, Setomoto, Yutaka, Den, Toru, Optics Technology Development Center, Corporate R and D Headquarters, Canon Inc., 23-10, Kiyohara-Kogyodanchi, Utsunomiya Tochigi 321-3231, Nanotechnology R and D Center, Corporate R and D Headquarters, Canon Inc., 3-30-2 Shimomaruko, Ohta-ku, Tokyo 146-8501

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X-ray imaging apparatus von OUCHI CHIDANE

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X-ray imaging apparatus von OUCHI CHIDANE

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X-ray imaging apparatus von OUCHI CHIDANE

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Broadband noise suppression for fiber-laser-based video-rate stimulated Raman scattering spectral microscopy von Ishikawa, Michio, Kohara, Naoki, Yonetani, Yuki, Yamamoto, Akira, Ouchi, Chidane, Hasegawa, Masanobu

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X-RAY IMAGING APPARATUS von OUCHI CHIDANE

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X-RAY IMAGING APPARATUS von OUCHI CHIDANE

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Wavefront-aberration-measuring device and exposure apparatus von OUCHI CHIDANE

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Wavefront-aberration-measuring device and exposure apparatus von Ouchi, Chidane

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X-RAY IMAGING APPARATUS von OUCHI CHIDANE

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