Trapped radical behavior of electron beam irradiated polytetrafluoroethylene fine powder at various temperatures von Oshima, Akihiro, Horiuchi, Hiroto, Nakamura, Atsushi, Kobayashi, Shun, Terui, Ayana, Mino, Ayano, Shimura, Ryoya, Washio, Masakazu

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Pentadecafluorooctanoic-acid-free polytetrafluoroethylene and mechanism of PFOA formation by γ-irradiation von Oshima, Akihiro, Tanaka, Takayuki, Nakaya, Hideki, Senba, Ryosuke, Satoh, Kazuyuki

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Spatially resolved spectral phase interferometry with an isolated attosecond pulse von Mashiko, Hiroki, Chen, Ming-Chang, Asaga, Koji, Oshima, Akihiro, Katayama, Ikufumi, Takeda, Jun, Nishikawa, Tadashi, Oguri, Katsuya

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Eco-friendly electron beam lithography using water-developable resist material derived from biomass von Takei, Satoshi, Oshima, Akihiro, Wakabayashi, Takanori, Kozawa, Takahiro, Tagawa, Seiichi

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Super High Sensitivity Enhancement by Photo-Sensitized Chemically Amplified Resist (PS-CAR) Process von Tagawa, Seiichi, Enomoto, Satoshi, Oshima, Akihiro

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Fabrication of thermo-responsive PNIPAAm-g-ETFE for cell culture dishes by pre-irradiation grafting von Yamahara, Yumi, Nagasawa, Naotsugu, Taguchi, Mitsumasa, Oshima, Akihiro, Washio, Masakazu

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Method of predicting resist sensitivity for 6.x nm extreme ultraviolet lithography von Oyama, Tomoko Gowa, Oshima, Akihiro, Washio, Masakazu, Tagawa, Seiichi

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Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam von Oyama, Tomoko Gowa, Oshima, Akihiro, Tagawa, Seiichi

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Stabilization of Exocytosis by Dynamic F-actin Coating of Zymogen Granules in Pancreatic Acini von Nemoto, Tomomi, Kojima, Tatsuya, Oshima, Akihiro, Bito, Haruhiko, Kasai, Haruo

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Organic solvent-free water-developable sugar resist material derived from biomass in green lithography von Takei, Satoshi, Oshima, Akihiro, Ichikawa, Takumi, Sekiguchi, Atsushi, Kashiwakura, Miki, Kozawa, Takahiro, Tagawa, Seiichi, Oyama, Tomoko G., Ito, Syoji, Miyasaka, Hiroshi

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Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer von Takei, Satoshi, Oshima, Akihiro, Sekiguchi, Atsushi, Yanamori, Naomi, Kashiwakura, Miki, Kozawa, Takahiro, Tagawa, Seiichi

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Fabrication of nanobeads from nanocups by controlling scission/crosslinking in organic polymer materials von Oyama, Tomoko Gowa, Oshima, Akihiro, Washio, Masakazu, Tagawa, Seiichi

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Electron-Beam Induced Shrinkage Effects on Line-Space Patterns of ZEP Resist von Dinh, Cong Que, Oshima, Akihiro, Nishijima, Shigehiro, Tagawa, Seiichi

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Novel High Sensitivity EUV Photoresist for Sub-7 nm Node von Nagai, Tomoki, Nakagawa, Hisashi, Naruoka, Takehiko, Dei, Satoshi, Tagawa, Seiichi, Oshima, Akihiro, Nagahara, Seiji, Shiraishi, Gosuke, Yoshihara, Kosuke, Terashita, Yuichi, Minekawa, Yukie, Buitrago, Elizabeth, Ekinci, Yasin, Yildirim, Oktay, Meeuwissen, Marieke, Hoefnagels, Rik, Rispens, Gijsbert, Verspaget, Coen, Maas, Raymond

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Micro/nanofabrication of poly(L-lactic acid) using focused ion beam direct etching von Oyama, Tomoko Gowa, Hinata, Toru, Nagasawa, Naotsugu, Oshima, Akihiro, Washio, Masakazu, Tagawa, Seiichi, Taguchi, Mitsumasa

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Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A von Oyama, Tomoko Gowa, Enomoto, Kazuyuki, Hosaka, Yuji, Oshima, Akihiro, Washio, Masakazu, Tagawa, Seiichi

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Free volume study of sulfonated FEP proton exchange membrane von Oka, Toshitaka, Oshima, Akihiro, Washio, Masakazu

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Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A von Hosaka, Yuji, Oyama, Tomoko Gowa, Oshima, Akihiro, Enomoto, Satoshi, Washio, Masakazu, Tagawa, Seiichi

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Surface modification of polymeric materials using ultra low energy electron beam irradiation von Oshima, Akihiro, Shiraki, Fumiya, Fujita, Hajime, Washio, Masakazu

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Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography von Takei, Satoshi, Oshima, Akihiro, Oyama, Tomoko G., Ito, Kenta, Sugahara, Kigen, Kashiwakura, Miki, Kozawa, Takahiro, Tagawa, Seiichi, Hanabata, Makoto

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