Effects of a negative self-bias on the growth of cubic boron nitride prepared by plasma chemical vapor deposition von YOKOYAMA, H, OKAMOTO, M, OSAKA, Y

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Formation and properties of cubic boron nitride films on tungsten carbide by plasma chemical vapor deposition von OKAMOATO, M, UTSUMI, Y, OSAKA, Y

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Theory of relaxation of frozen defects in doped hydrogenated amorphous silicon von OSAKA, Y

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Heteroepitaxial growth of Y2O3 films on silicon von FUKUMOTO, H, IMURA, T, OSAKA, Y

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Visible photoluminescence from Si microcrystals embedded in SiO2 glass films von OSAKA, Y, TSUNETOMO, K, TOYOMURA, F, MYOREN, H, KOHNO, K

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PHYSICAL PROPERTIES OF SiO2-DOPED Si FILMS AND ELECTROLUMINESCENCE IN METAL/SiO2-DOPED Si/P-Si DIODES von Osaka, Y, Kohno, K, Mizuno, H, Koshida, N

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Formation of cubic boron nitride film on Si with boron buffer layers von OKAMOTO, M, YOKOYAMA, H, OSAKA, Y

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Photoluminescence of Si microcrystals embedded in SiO2 glass films von KOHNO, K, OSAKA, Y, TOYOMURA, F, KATAYAMA, H

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Physical Properties of Heavily B-doped Microcrystalline Si–Ge Alloys and Schottky Barrier of B–Si–Ge/P-Si von Osaka, Yukio, Kohno, Kenji, Tanabe, Yukiya

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Infrared polarized reflection spectra of SrTiO3 thin films on metal/Si von MYOREN, H, MATSUMOTO, T, OSAKA, Y

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Formation of cubic boron nitride films on diamond by plasma CVD technique von OKAMOTO, M, UTSUMI, Y, OSAKA, Y

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Preparation and properties of Si microcrystals embedded in SiO2 glass films von YAMAMOTO, M, HAYASHI, R, TSUNETOMO, K, KOHNO, K, OSAKA, Y

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Heteroepitaxial growth of yttria-stabilized zirconia (YSZ) on silicon von FUKUMOTO, H, IMURA, T, OSAKA, Y

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Formation of metal-insulator-semiconductor structure (B/hexagonal BN/graphite) by plasma chemical vapor deposition von OSAKA, Y, NAKAGAWA, N, KOHNO, K

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Isolation and Characterization of an Invertase and Its Repressor Genes fromSchizosaccharomyces pombe von Tanaka, Naotaka, Ohuchi, Nobuhiro, Mukai, Yukio, Osaka, Yukio, Ohtani, Yoshihiko, Tabuchi, Mitsuaki, Bhuiyan, M.Shah Alam, Fukui, Hiroshi, Harashima, Satoshi, Takegawa, Kaoru

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Function of substrate bias potential for formation of cubic boron nitride films in plasma CVD technique von CHAYAHARA, A, YOKOYAMA, H, IMURA, T, OSAKA, Y

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Infrared Polarized Reflection Spectra of SrTiO 3 Thin Films on Metal/Si von Myoren, Hiroaki, Takeshi Matsumoto, Takeshi Matsumoto, Yukio Osaka, Yukio Osaka

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Preparation and properties of Ge microcrystals embedded in SiO2 glass films von HAYASHI, R, YAMAMOTO, M, TSUNETOMO, K, KOHNO, K, OSAKA, Y, NASU, H

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Nonlinear I-V Characteristics of Bi 2 Sr 2 CaCu 2 O x Thin Films von Myoren, Hiroaki, Takatoshi Ishikawa, Takatoshi Ishikawa, Yukio Osaka, Yukio Osaka

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Preparation and Properties of In x Ga 1-x As Microcrystallites Embedded in SiO 2 Glass Films von Tsunetomo, Keiji, Masaki Yamamoto, Masaki Yamamoto, Yukio Osaka, Yukio Osaka

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