Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element von WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MEIJERINK MARCO G. H, STORM ARNOLDUS JAN, NIENOORD MICHIEL, MOORS JOHANNES HUBERTUS JOSEPHINA, VAN SOEST-VERCAMMEN ESTHER L. J, OPREL PETER J, GUBBELS FRITS G. H. M, VAN DE RUNSTRAAT ANNEMIEKE, RIEPEN MICHEL, STEIN THOMAS, KOSTER NORBERTUS BENEDICTUS, BASTEIN A. G. TON M

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Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element von Ehm, Dirk Heinrich, Van De Runstraat, Annemieke, Wolschrijn, Bastiaan Theodoor, Storm, Arnoldus Jan, Stein, Thomas, Meijerink, Marco G. H, Bastein, A. G. Ton M, Van Soest-Vercammen, Esther L. J, Koster, Norbertus Benedictus, Gubbels, Frits G. H. M, Oprel, Peter J, Nienoord, Michiel, Riepen, Michel, Moors, Johannes Hubertus Josephina

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OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HEATED OPTICAL ELEMENT, OPERATING METHODS, AND METHODS FOR CLEANING AS WELL AS FOR PROVIDING AN OPTICAL ELEMENT von WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MEIJERINK MARCO G. H, STORM ARNOLDUS JAN, NIENOORD MICHIEL, MOORS JOHANNES HUBERTUS JOSEPHINA, VAN SOEST-VERCAMMEN ESTHER L. J, OPREL PETER J, GUBBELS FRITS G. H. M, VAN DE RUNSTRAAT ANNEMIEKE, RIEPEN MICHEL, STEIN THOMAS, KOSTER NORBERTUS BENEDICTUS, BASTEIN A. G. TON M

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Cleaning method for reflective optical element, particularly for soft X-ray and extreme ultraviolet wavelength range, and for operation of extreme ultraviolet lithography device, i... von RIEPEN, MICHEL, STORM, ARNOLD, RUNSTRAAT, ANNEMIEKE VAN DE, OPREL, PETER J, EHM, DIRK HEINRICH, KOSTER, NORBERTUS BENEDICTUS, NIENOORD, MICHIEL, WOLSCHRIJN, BASTIAAN THEODOOR, STEIN, THOMAS, GUBBELS, FRITS G.H.M, MOORS, ROEL JOHANNES HUBERTUS JOSEPHINA, BASTEIN, TON, SOEST-VERCAMMEN, ESTHER L.J, MEIJERINK, MARCO G. H

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Verfahren zum Betrieb einer EUV-Lithographievorrichtung, reflektives optisches Element für EUV-Lithographievorrichtung und Verfahren zu dessen Reinigung von RIEPEN, MICHEL, STORM, ARNOLD, RUNSTRAAT, ANNEMIEKE VAN DE, OPREL, PETER J, EHM, DIRK HEINRICH, KOSTER, NORBERTUS BENEDICTUS, NIENOORD, MICHIEL, WOLSCHRIJN, BASTIAAN THEODOOR, STEIN, THOMAS, GUBBELS, FRITS G.H.M, MOORS., ROEL JOHANNES HUBERTUS JOSEPHINA, BASTEIN, TON, SOEST-VERCAMMEN, ESTHER L.J., VAN, MEIJERINK, MARCO G. H

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