Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry von Ohno, Takahiro, Yagyu, Daisuke, Saito, Shigeru, Ohno, Yasunori, Nakano, Hirofumi, Itoh, Masatoshi, Uhara, Yoshio, Miura, Tsutomu

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Copper Filling of Deep Submicrometer Trenches with Cobalt-Lined Barrier Metal Produced by High-Vacuum Magnetron Sputtering by Using supercritical Carbon Dioxide Method von OHNO, Yasunori, ITOH, Masatoshi, NUMAKAWA, Tomonori, KAMIUTTANAI, Kota, OTAKE, Katsuto, SAITO, Shigeru

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Conformation of deltorphin‐II in membrane environment studied by two‐dimensional NMR spectroscopy and molecular dynamics calculations von OHNO, Yasunori, SEGAWA, Motozumi, OHISHI, Hirofumi, DOI, Mitsunobu, KITAMURA, Kunihiro, ISHIDA, Toshimasa, INOUE, Masatoshi, IWASHITA, Takashi

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Copper Filling of Deep Sub-μm Through-Holes and Trenches by Using High-Vacuum Magnetron Sputtering and Supercritical Carbon Dioxide von ITOH, Masatoshi, NUMAKAWA, Tomonori, OHNO, Yasunori, TERASAKI, Masato, MAEDA, Yuuki, UHARA, Yoshio, OTAKE, Katsuto, SAITO, Shigeru

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Large-area doping process for fabrication of poly-Si thin film transistors using bucket ion source and XeCl excimer laser annealing von KAWACHI, G, AOYAMA, T, SUZUKI, T, MIMURA, A, OHNO, Y, KONISHI, N, MOCHIZUKI, Y, MIYATA, K

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Copper Filling of Deep Submicrometer Trenches with Cobalt-Lined Barrier Metal Produced by High-Vacuum Magnetron Sputtering by Using supercritical Carbon Dioxide Method von OHNO, Yasunori, ITOH, Masatoshi, NUMAKAWA, Tomonori, KAMIUTTANAI, Kota, OTAKE, Katsuto, SAITO, Shigeru

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Copper Filling of Deep Sub-μm Through-Holes and Trenches by Using High-Vacuum Magnetron Sputtering and Supercritical Carbon Dioxide von ITOH, Masatoshi, NUMAKAWA, Tomonori, OHNO, Yasunori, TERASAKI, Masato, MAEDA, Yuuki, UHARA, Yoshio, OTAKE, Katsuto, SAITO, Shigeru

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Large-area doping for poly-Si thin film transistors using bucket ion source with on RF plasma cathode von KAWACHI, G, AOYAMA, T, SUZUKI, T, OHNO, Y, MIMURA, A, MOCHIZUKI, Y

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高真空スパッタ法で作製された Co バリア層付きトレンチへの超臨界 CO2 法による Cu 埋め込み von 大野, 泰典, 伊藤, 勝利, 沼川, 智則, 上打田内, 康太, 大竹, 勝人, 斉藤, 茂

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高真空スパッタと超臨界 CO2 を用いた微細孔の埋め込み von 伊藤, 勝利, 沼川, 智則, 大野, 泰典, 寺崎, 雅人, 前田, 優樹, 宇原, 祥夫, 大竹, 勝人, 斉藤, 茂

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Comparative conformational analyses of μ-selective dermorphin and §-selective deltorphin-II in aqueous solution by 1H-NMR spectroscopy von SEGAWA, MOTOZUMU, OHNO, YASUNORI, DOI, MITSUNOBU, INOUE, MASATOSHI, ISHIDA, TOSHIMASA, IWASHITA, TAKASHI

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METHOD AND APPARATUS FOR CONTROLLING AN ELECTRIC DISCHARGE MACHINE von YASUNORI OHNO, EIICHIRO ASANO

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CIRCUITO DI CONTROLLO DELLA CORRENTE PER UNA MACCHINA TAGLIAFILO A SCARICA ELETTRICA von YASUNORI OHNO, EIICHIRO ASANO

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Method and apparatus for controlling an electric discharge machine von YASUNORI OHNO, EIICHIRO ASANO

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STROMSTEUERKREIS FUER EINE ELEKTRISCHE ENTLADUNGSVORRICHTUNG von ASANO,EIICHIRO, OHNO,YASUNORI

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CIRCUITO DI CONTROLLO DELLA CORRENTE PER UNA MACCHINA TAGLIAFILO A SCARICA ELETTRICA von YASUNORI OHNO, EIICHIRO ASANO

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CIRCUIT DE COMMANDE DE COURANT POUR MACHINE A DECHARGES ELECTRIQUES DE COUPE PAR FIL von YASUNORI OHNO ET EIICHIRO ASANO

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Sputtering apparatus for forming thin films von SETOYAMA, EIJI, OHNO, YASUNORI, KAMEI, MITSUHIRO

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Microwave-powered plasma-generating apparatus and method von IGA, TAKASHI, SAKUDO, NORIYUKI, HASHIMOTO, ISAO, OHNO, YASUNORI, NATSUI, KENICHI

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Current control circuit for electro-erosion machine von YASUNORI OHNO ET EIICHIRO ASANO

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