A New Proximity Parameter Evaluation Method Utilizing Auxiliary Patterns for Dose Compensation von Uchiyama, Shingo, Shigehisa Ohki, Shigehisa Ohki, Tadahito Matsuda, Tadahito Matsuda

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Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1× X-Ray Masks von Shinji Tsuboi, Shinji Tsuboi, Hiroshi Watanabe, Hiroshi Watanabe, Mizunori Ezaki, Mizunori Ezaki, Hajime Aoyama, Hajime Aoyama, Yukiko Kikuchi, Yukiko Kikuchi, Yoshinori Nakayama, Yoshinori Nakayama, Shigehisa Ohki, Shigehisa Ohki, Toshifumi Watanabe, Toshifumi Watanabe, Tetsuo Morosawa, Tetsuo Morosawa, Kenichi Saito, Kenichi Saito, Masatoshi Oda, Masatoshi Oda, Tadahito Matsuda, Tadahito Matsuda

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Rapid Optical Connector Polishing Machine for on-site Connecting von MATSUI, Shinsuke, OHKI, Shigehisa, YANAGI, Shuichi, NAGASE, Ryo, KOBAYASHI, Masaru

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X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes von Ohki, Shigehisa, Yoshihara, Tadahito Matsuda

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Opto-Electronic Chip-on-Film Packaging Technology Using Low-CTE Fluorinated Polyimide Optical Waveguide Films von Usui, Mitsuo, Ishibashi, Shigeki, Hirata, Hirooki, Ishizawa, Suzuko, Koshoubu, Nobutatsu, Hayashi, Tsuyoshi, Ohki, Shigehisa

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X-ray mask fabrication using new membrane process techniques von UCHIYAMA, S, ODA, M, MATSUDA, T, OHKI, S

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Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication von Ezaki, Mizunori, Nakayama, Yoshinori, Kikuchi, Yukiko, Tsuboi, Shinji, Watanabe, Hiroshi, Aoyama, Hajime, Matsui, Yasuji, Morosawa, Tetsuo, Ohki, Shigehisa, Saito, Kenichi, Matsuda, Tadahito

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High-precision X-ray mask technology von OHKI, S, YOSHIHARA, H

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Improving X-ray mask pattern placement accuracy by correcting process distortion in electron beam writing von UCHIYAMA, S, OHKI, S, OZAWA, A, ODA, M, MATSUDA, T, MOROSAWA, T

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Ta film properties for X-ray mask absorbers von ODA, M, OZAWA, A, OHKI, S, YOSHIHARA, H

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Simulation of X-Ray Mask Distortion von Oda, Masatoshi, Ohki, Shigehisa, Ozawa, Akira, Takashi Ohkubo, Takashi Ohkubo, Hideo Yoshihara, Hideo Yoshihara

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Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs von Ohki, Shigehisa, Kakuchi, Masami, Matsuda, Tadahito, Ozawa, Akira, Ohkubo, Takashi, Oda, Masatoshi, Yoshihara, Hideo

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Photoinduced Optical Changes in Amorphous Silicon-Carbon Alloy Prepared by Reactive Sputtering in an Atmosphere of Propane von Iida, Seishi, Ohki, Shigehisa

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Evaluation of image placement correction method for EB X-ray mask writing von Watanabe, Toshifumi, Ohki, Shigehisa, Uchiyama, Shingo

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An overview of X-ray lithography von Ohki, Shigehisa, Ishihara, Sunao

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Patterning performance of EB-X3 x-ray mask writer von Ohki, Shigehisa, Watanabe, Toshifumi, Takeda, Yuji, Morosawa, Tetsuo, Saito, Kenichi, Kunioka, Tatsuya, Kato, Junichi, Shimizu, Akira, Matsuda, Tadahito, Tsuboi, Shinji, Aoyama, Hajime, Watanabe, Hiroshi, Nakayama, Yoshinori

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High-accuracy X-ray masks with sub-half-micron 1M-DRAM chips von Ohki, Shigehisa, Oda, Masatoshi, Kakuchi, Masami, Yoshihara, Hideo

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Electric field-induced absorption in GaInAsP/InP MQW structures grown by LPE von OHKI, Y, SHIMOMURA, K, KIKUGAWA, T, RAVIKUMAR, K. G, IZUMI, A, ARAI, S, SUEMATSU, Y

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Electric field induced reflection in GaInAsP/InP MQW structure von KIKUGAWA, T, RAVIKUMAR, K. G, SHIMOMURA, K, IZUMI, A, ARAI, S, SUEMATSU, Y, OHKI, Y

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